SCEJ

$B2=3X9)3X2q(B $BBh(B43$B2s=)5(Bg2q(B

$B9V1i%W%m%0%i%`!J%;%C%7%g%sJL!K(B

$B%7%s%]%8%&%`(B $B!c(BCVD$B!&%I%i%$%W%m%;%9!!!]9=B$!&5!G=@)8f$NH?1~9)3X!]!d(B

U213-U219, U300-U326

$B%*!<%,%J%$%6!<(B $BsnF#>fLw!JBg:eI\Bg!K!&6LCVD>

$B4D6-!&%(%M%k%.!HL@!"%G%#%9%W%l%$$K8~$1$?BgLL@Q$+$DDc%3%9%H$G$NGvKl!&HyN3;R7A@.5;=Q$,CmL\$r=8$a$F$$$^$9!#$^$?!"Hy:Y2=8B3&$N8+$($F$-$?EE;R%G%P%$%9$K$*$$$F$b!"?7$7$$9b5!G=Kl$N@=Kl!&2C9)5;=Q$,5a$a$i$l$F$$$^$9!#FCDj$N1~MQMQES$K$H$i$o$l$k$3$H$J$/!"H?1~%a%+%K%:%`$NM}2r$rDL$7$F!"9-$/GvKl7A@.!&HyN3;R9g@.!&Hy:Y2C9)%W%m%;%9$K$*$1$k9=B$!&5!G=@)8f$NJ}K!O@$K$D$$$F5DO@$9$k$3$H$rL\E*$H$7$^$9!#%H%i%$%"%k!u%(%i!<$KMj$i$J$$O@M}E*$J:GE,2=$NJ}K!O@$r9M$($k$3$H$G!";22C

$B:G=*99?7F|;~!'(B2011-08-16 00:00:00
$B9V1i(B
$B;~9o(B		$B9V1i(B
$BHV9f(B		$B9V1iBjL\!?H/I=$B%-!<%o!<%I(B$BJ,N`(B
$BHV9f(B		$B$BHV9f(B
U$B2q>l(B $BBh(B2$BF|(B
(13:00$B!A(B14:00)$B!!(B($B:BD9(B $BEgED(B $B3X(B)
13:00$B!A(B 13:20U213$B5^B.>xCe!&%(%T%?%-%7%c%k%j%U%H%*%UK!$K$h$kB@M[EECSMQC17k>=%7%j%3%sGvKl$N:n@=(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BW"ED(B $B9,M4(B $B!&(B ($BH>0l(B) $B@P66(B $B7r0l(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BDT(B $B2B;R(B $B!&(B ($B@5(B)$BLnED(B $BM%(B
single crystal silicon film
epitaxial growth
rapid vapor deposition
S-31433
13:20$B!A(B 13:40U214Rapid vapor deposition of porous Si anodes for lithium ion batteries and control of their interface with Cu collector electrodes
($BElBg1!9)(B) $B!{(B($B3X(B)$BM{(B $B=EZ_(B $B!&(B ($B=;M'2=3X(B) $B>>K\(B $B?58c(B $B!&(B $B;3K\(B $BIp7Q(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BLnED(B $BM%(B
physical vapor deposition
porous silicon films
lithium ion batteries
S-31398
13:40$B!A(B 14:00U215$B9b8zN(B@M[EECSMQ(BInGaAs/GaAsP$BD63J;R$N(BMOVPE$B$K$*$1$k%X%F%m3&LL@)8f(B
($BElBg9)(B) $B!{(B($B@5(B)$B?y;3(B $B@5OB(B $B!&(B ($BElBg@hC<8&(B) $B2&(B $B1>K2(B $B!&(B $BEOJU(B $B7rB@O:(B $B!&(B $BCfLn(B $B5A><(B
solar cell
MOVPE
hetero interface
S-31894
(14:00$B!A(B15:00)$B!!(B($B:BD9(B $BLnED(B $BM%(B)
14:00$B!A(B 14:20U216Using in-situ curvature measurement and simulation to optimize growth of InGaAs/GaAsP strain-compensated multiple quantum wells
($BElBg1!9)(B) $B!{(B($B3X(B)$BGO(B $B>/=Y(B $B!&(B ($BElBg@hC<8&(B) ($BIt(B)Hassanet Sodabanlu $B!&(B ($BIt(B)$BEOJU(B $B7rB@O:(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$B?y;3(B $B@5OB(B $B!&(B ($BElBg@hC<8&(B) ($B@5(B)$BCfLn(B $B5A><(B
Curvature
MOVPE
Semiconducting III-V materials
S-31858
14:20$B!A(B 14:40U217InxGa(1-x)P$B$N(BMOVPE $B$K$*$1$k$=$N>l6JN(4Q;!$K$h$kAH@.7hDj$N
($BElBg@hC<8&(B) $B!{(B($BIt(B)$BEOJU(B $B7rB@O:(B $B!&(B ($BIt(B)Sodabanlu Hassanet $B!&(B ($BElBg1!9)(B) ($B3X(B)$BGO(B $B>/=Y(B $B!&(B ($BIt(B)$B?y;3(B $B@5OB(B $B!&(B ($BElBg@hC<8&(B) ($BIt(B)$BCfLn(B $B5A><(B
MOVPE
in situ MOSS
strain management
S-31882
14:40$B!A(B 15:20U218[$BE8K>9V1i(B] $BB@M[EECSMQ(BCVD$BAuCV$N5;=QF08~$HE8K>(B
($B%+%M%+(B) $B!{9b66(B $BIpNI(B
solar cell
CVD
S-31642
U$B2q>l(B $BBh(B3$BF|(B
(8:40$B!A(B10:20)$B!!(B($B:BD9(B $B?9(B $B?-2p(B)
8:40$B!A(B 9:00U300$BD6NW3&N.BN$rMQ$$$?(BSiO2$B@=Kl$K$*$1$kN.$l%Q%?!<%s$N1F6AI>2A(B
($B%G%s%=!<(B) $B!{(B($B@5(B)$B;3ED(B $B1QM:(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B$_$:$[>pJsAm8&(B) ($B@5(B)$B4d:j(B $BBsLi(B $B!&(B $B>.Ln(B $B9LJ?(B $B!&(B ($B%G%s%=!<(B) $BBg86(B $B=_;N(B $B!&(B $BKLB<(B $B9/9((B $B!&(B ($B?.=#Bg9)(B) ($B@5(B)$BFbED(B $BGn5W(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B $B!&(B ($B@5(B)$B?y;3(B $B@5OB(B
supercritical fluid
deposition
SiO2
S-31566
9:00$B!A(B 9:20U301$B4pHD2CG.7?D6NW3&@=KlAuCV$N?tCMN.BN%7%_%e%l!<%7%g%s(B(III)
($B$_$:$[>pJsAm8&(B) $B!{(B($B@5(B)$B4d:j(B $BBsLi(B $B!&(B $B>.Ln(B $B9LJ?(B $B!&(B ($B%G%s%=!<(B) ($B@5(B)$B;3ED(B $B1QM:(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B?.=#Bg9)(B) ($B@5(B)$BFbED(B $BGn5W(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B $B!&(B ($B@5(B)$B?y;3(B $B@5OB(B
Supercritical Fluid Deposition
omputational Flued Dynamics
Convection
S-31704
9:20$B!A(B 9:40U302$BD6NW3&(BCu$BGvKlBO@Q%W%m%;%9$NBN7OE*M}2r$K4p$E$/%&%'%O%9%1!<%kH?1~4o@_7W(B
($BElBg1!9)(B) $B!{(B($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B@5(B)$B?y;3(B $B@5OB(B $B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
Supercritica Fluid
Deposition
Cu
S-31934
9:40$B!A(B 10:00U303Formation of Strontium Oxide Thin Film using Supercritical Fluid Deposition
(U. Tokyo) $B!{(B($B3X(B)Jung Kyubong $B!&(B ($B@5(B)Momose Takeshi $B!&(B ($B@5(B)Shimogaki Yukihiro
Supercritical Fluid Deposition
Oxidizer
Strontium oxide
S-31886
10:00$B!A(B 10:20U304$BD6NW3&Fs;@2=C:AGCf$K$*$1$kJ#9g;@2=J*GvKl$N:n@.(B
($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$B>.Eg(B $B>O8w(B $B!&(B $BW"ED(B $BM40lO:(B $B!&(B $BCfED(B $B^+ $B!&(B ($B@5(B)$B2,K\(B $B>0 $B!&(B ($B@5(B)$BsnF#(B $B>f{J(B $B!&(B ($B@5(B)$B6aF#(B $BOBIW(B $B!&(B ($BElKLBgB?858&(B) ($B@5(B)$B9b8+(B $B@?0l(B
supercritical carbon dioxide
thin film
metal oxide
S-31459
(10:20$B!A(B11:40)$B!!(B($B:BD9(B $B6LCV(B $BD>
10:20$B!A(B 10:40U305$BD6NW3&N.BN$rMxMQ$7$?(B3$B
($BElBg1!9)(B) $B!{(B($B3X(B)$BEOn4(B $B7=(B $B!&(B ($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
Ruthenium
Platinum
Supercritical Fluid Deposition
S-31444
10:40$B!A(B 11:00U306$BL5EE2r$a$C$-$K$h$k%k%F%K%&%`GvKl$N:n@.(B
($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$B5HED(B $BM*M$(B $B!&(B ($B3X(B)$B9bLZ(B $B9/9T(B $B!&(B ($B@5(B)$B2,K\(B $B>0 $B!&(B ($B@5(B)$BsnF#(B $B>f{J(B $B!&(B ($B@5(B)$B6aF#(B $BOBIW(B
electroless plating
ruthnium
barriermetal
S-31490
11:00$B!A(B 11:20U307Al$B%I!<%W;@2=0!1tEE6K$rMQ$$$?6/M6EEBN%-%c%Q%7%?$NNt2=FC@-I>2A(B
($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$BDT(B $BE0(B $B!&(B $B|bED(B $B`v;R(B $B!&(B ($B@5(B)$B2,K\(B $B>0 $B!&(B ($B@5(B)$BsnF#(B $B>f{J(B $B!&(B ($B@5(B)$B6aF#(B $BOBIW(B $B!&(B $B5HB<(B $BIp(B $B!&(B $BF#B<(B $B5*J8(B $B!&(B ($B:eBg;:8&(B) $BKLEg(B $B>4(B $B!&(B $BBgEg(B $BL@Gn(B
ferroelectric material
zinc oxide
pulsed laser deposition
S-31216
11:20$B!A(B 12:00U308[$BE8K>9V1i(B] $B%Q%o!<%(%l%/%H%m%K%/%9J,Ln$K$*$1$k(BCVD$B5;=Q$NE83+(B
($BK-EDCf8&(B) $B!{(B($B@5(B)$B>._7(B $BN490(B
power electronics
chemical vapor deposition
S-31930

(13:00$B!A(B14:00)$B!!(B($B:BD9(B $BAz3@(B $B9,9@(B)
13:00$B!A(B 13:40U313[$BE8K>9V1i(B] $BB@M[EECS!&G3NAEECS$K$*$1$k%_%/%m%J%N9=B$@)8f$H%0%j!<%s%$%N%Y!<%7%g%s$X$NE83+(B
($BEl9)Bg2=3X(B) $B!{(B($B@5(B)$B0K86(B $B3X(B
fuel cell
solar cell
reaction engineering
S-31636
13:40$B!A(B 14:00U315PE-CVD$BCf$G$N9bB.J.N.$rMQ$$$?%7%j%3%s@=Kl$NH?1~2r@O(B
($B4tIlBg1!9)(B) $B!{(B($B@5(B)$B@>ED(B $BE/(B $B!&(B $BEDCf(B $BD>Li(B $B!&(B $BLnB<(B $BM44u(B $B!&(B $BL6ED(B $B9@;J(B $B!&(B $B7*NS(B $B;VF,bC(B
Si deposition
super sonic jet
CFD
S-311089
(14:00$B!A(B15:20)$B!!(B($B:BD9(B $B?y;3(B $B@5OB(B)
14:00$B!A(B 14:20U316RF$B%W%i%:%^(BCVD$BK!$K$h$k(BTiC$BGvKl$NDc29@.D9$HJ*@-I>2A(B
($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$B@/2,(B $B90PR(B $B!&(B ($B:eI\Bg9)(B) $B>>K\(B $B:4OB;R(B $B!&(B ($B:eI\Bg1!9)(B) ($B@5(B)$B2,K\(B $B>0 $B!&(B ($B@5(B)$BsnF#(B $B>f{J(B $B!&(B ($B@5(B)$B6aF#(B $BOBIW(B $B!&(B ($B%"%k%F%C%/%9(B) $BRy(B $BCRFW(B
film growth
chemical vapor deposition
titanium carbide
S-31400
14:20$B!A(B 14:40U317SiC-CVD$B%W%m%;%9H?1~5!9=$N%^%k%A%9%1!<%k2r@O(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BJ!Eg(B $B9/G7(B $B!&(B (IHI$B4pHW5;8&(B) $BJ]8MDM(B $B>?(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B
Silicon Carbide
CVD
reaction kinetics
S-3168
14:40$B!A(B 15:00U318$B2A(B
($BElKLBg(BWPI$B:`NA5!9=(B) $B!{(B($B@5(B)$BKL[j(B $BBg2p(B $B!&(B ($B@5(B)$B0$?,(B $B2mJ8(B
ALD
Mass analysis
Conformal coatings
S-31783
15:00$B!A(B 15:20U319$B6bB0GvKl?(G^$rMQ$$$?2=3X5$Aj@.D9K!$K$h$k%0%i%U%'%s$N9g@.(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BA}ED(B $BN5Li(B $B!&(B ($B@5(B)$BLnED(B $BM%(B
CVD
graphene
interlayer
S-31579
(15:20$B!A(B16:20)$B!!(B($B:BD9(B $B2O@%(B $B85L@(B)
15:20$B!A(B 15:40U320$BC1AX%+!<%\%s%J%N%A%e!<%V$N(BCVD$B9g@.$K$*$1$k%<%*%i%$%H?(G^C4BN$N1F6A(B
($BElBg1!9)(B) $B!{(B($B3X(B)$B3[2l(B $BBg51(B $B!&(B ($B3X(B)$BLPLZ(B $Bt!I'(B $B!&(B $B4];3(B $BLPIW(B $B!&(B ($B@5(B)$BBg5WJ](B $BC#Li(B
single-walled carbon nanotube
zeolite
CVD
S-311008
15:40$B!A(B 16:00U321$BE47O9g6b%P%k%/I=LL$rMQ$$$?%+!<%\%s%J%N%A%e!<%V9g@.K!(B
($B5~Bg1!9)(B) $B!{(B($B3X(B)$B;3K\(B $B7f(B $B!&(B ($B@5(B)$B:4Ln(B $B5*>4(B $B!&(B ($B@5(B)$BEDLg(B $BH%(B
carbon nano tube
chemical vapor deposition
S-31275
16:00$B!A(B 16:20U322$B41G=4p=$>~$5$l$?(BMWCNTs$B>e$X$N%K%C%1%k@O=P$KBP$9$kM-5!7OE:2CJ*8z2L(B
($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$B9bLZ(B $B9/9T(B $B!&(B ($B@5(B)$BsnF#(B $B>f{J(B $B!&(B ($B@5(B)$B2,K\(B $B>0 $B!&(B ($B@5(B)$B6aF#(B $BOBIW(B $B!&(B ($B:e;T9)8&(B) $B>.NS(B $BLwG7(B $B!&(B $BF#86(B $BM5(B
carbon nanotube
nickel
electroless plating
S-31502
(16:20$B!A(B17:40)$B!!(B($B:BD9(B $BsnF#(B $B>f{J(B)
16:20$B!A(B 16:40U323$B%+!<%\%s%J%N%U%!%$%P!<$NL5?(G^Dc29%W%i%:%^(BCVD$B$K$*$1$k4pHD7A>u$N1F6A(B
($BEl9)Bg1!M}9)(B) $B!{(B($B@5(B)$B?9(B $B?-2p(B $B!&(B ($BEl9)Bg9)(B) $B;3ED(B $BM*2p(B $B!&(B ($BEl9)Bg1!M}9)(B) ($B@5(B)$BNkLZ(B $B@5><(B
plasma-enhanced CVD
carbon nanofiber
carbon monoxide
S-31699
16:40$B!A(B 17:00U324$BHs6E=8%J%N%5%$%:N3;R$N5$AjBO@Q$K$h$kGvKl9=B$$N7A@.(B
($B9-Bg1!9)(B) $B!{(B($B3X(B)$B@P86(B $BM*(B $B!&(B $BHSED(B $BBg $B!&(B ($B@5(B)$BEgED(B $B3X(B
Non-agglomerated nanoparticle
Thin film
Aerosol deposition
S-31954
17:00$B!A(B 17:20U325$B4pHD>eIUCeHyN3;R$K$h$k?eJ,2p:_1x@w8=>](B
($B9-Bg1!9)(B) $B!{(B($B3X(B)$BC*66(B $B9n?C(B $B!&(B $BCf@>(B $B2m65(B $B!&(B ($B@5(B)$BEgED(B $B3X(B $B!&(B ($BEl5~%(%l%/%H%m%s(BAT) $BD9CS(B $B9(;K(B $B!&(B ($BEl5~%(%l%/%H%m%s(B) $B
Particle on surface
Microcontamination
Water deposition
S-31961
17:20$B!A(B 17:40U326$B9b$$8w?(G^3h@-<($9%A%?%K%"HyN3;R$N5$Aj9g@.(B
($B@.l~BgM}9)(B) $B!{(B($B3X(B)$B1v0f(B $B?NI'(B $B!&(B ($B3X(B)$B;3@n(B $BEm;R(B $B!&(B ($B@5(B)$B $B!&(B ($B@5(B)$B;3:j(B $B>O90(B $B!&(B ($B@5(B)$BN$@n(B $B=EIW(B $B!&(B ($B@5(B)$B2CF#(B $BLP(B $B!&(B ($B@5(B)$B>.Eg(B $B5*FA(B
gas phase
hydrolysis
photocatalyst
S-31827
$B9V1i%W%m%0%i%`(B
$B2=3X9)3X2q(B $BBh(B43$B2s=)5(Bg2q(B
(C) 2011 $B8x1W
Most recent update: 2011-08-16 00:00:00
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