Plasma - Program search result - SCEJ 50th Autumn Meeting (Kagoshima, 2018)

`SCEJ 50th Autumn Meeting (Kagoshima, 2018)`

Last modified: 2018-09-04 10:00:00

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Program search result : Plasma : 7 programs

The abstracts can be viewed by clicking the Paper IDs.
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)

Keywords field exact matches “Plasma”; 7 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Day 1 14:40– 17:40	PB102	Investigations of activated nitrogen gas phase in ammonia production through Plasma/Liquid interfacial reaction (Kyutech) *(Stu)Sakakura Tatsuya, Tsuchida Yuto, (Stu)Hino Mutsuki, Murakami Naoya, Takatsuji Yoshiyuki, (Reg)Haruyama Tetsuya	Ammonia Plasma Activated nitrogen	ST-27	270
Day 1 14:40– 17:40	PB103	UV irradiation effect in ammonia production on P/L reaction locus (Kyutech) *(Stu)Hino Mutsuki, (Stu)Sakakura Tatsuya, Takatsuji Yoshiyuki, (Reg)Haruyama Tetsuya	Ammonia UV Plasma	ST-27	281
Day 2 9:00– 9:20	FB201	Development of plate plasma membrane reactor with a flow channel (Gifu U.) *(Stu)Sato Hiroki, Elshafie Mostafa, Sakai Ryoma, Kanayama Haruki, (Reg)Kambara Shinji, (Reg)Hayakawa Yukio, (Sawafuji Electric) Miura Tomonori	Ammonia Plasma Hydrogen production	ST-22	393
Day 2 14:00– 14:20	FB216	Direct Ammonia Synthesis from Nitrogen and Hydrogen by Activated Cokes-Induced Microwave Plasma (Gifu U.) *(Stu)Shiraki Takashi, (Reg)Suami Akira, (Reg)Kobayashi Nobusuke, (Reg)Itaya Yoshinori	Plasma Ammonia	ST-22	1070
Day 2 14:20– 14:40	FB217	Effect of Plasma Irradiation on Particle Dynamics in 2-D Spouted Bed (Gifu U.) *(Stu)Zhang Baiqiang, (Reg)Kobayashi Nobusuke, (Reg)Itaya Yoshinori, Ono Kyosuke	Plasma Spouted bed Particle Dynamics	ST-22	245
Day 3 9:30– 12:00	PA313	Development of novel reactor to decompose organic compounds in water using irradiation of dielectric barrier discharge onto water (Kyoto U.) *(Stu)Qi weijian, (Reg)Sano Noriaki	water purifiation plasma methylene blue	SY-58	620
Day 3 14:00– 14:20	CD316	[Invited lecture] Interface level formation at SiO₂/Si by plasma etching (Sony Semiconductor Manufacturing) *Nagahata Kazunori, Shigetoshi Takushi	Plasma Etching Damage	ST-25	330

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SCEJ 50th Autumn Meeting (Kagoshima, 2018)

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