Nishida Satoshi - Program search result - SCEJ 51st Autumn Meeting (2020)

`SCEJ 51st Autumn Meeting (2020)`

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Program search result : Nishida Satoshi : 1 program

All sessions can be attended from the On-line (Virtual) Meeting Site.
Preprints(Abstracts) are now open. Click the Paper IDs. (Registered participants and invited persons only)
The ID/PW was sent on Sept. 10 (for earlybird registered participants) or on Sept. 23 (for on-site registered participants).
(Aug. 8) Flash session of SY-69 has been cancelled.
(Aug. 24,27) Schedule of SY-74 (X306, X307) and HQ-11 (D301) has been changed.

Authors field exact matches “Nishida Satoshi”; 1 program is found.
The search results are sorted by the start time.

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Day 2 13:00– 14:20	Chair: Nishida Satoshi
	K213	[Invited lecture] A new HVPE growth technique which brings high quality GaN substrates; maskless-3D (Sciocs) Yoshida Takehiro	GaN substrate, HVPE low dislocation density	ST-22	112
	K214	Effect of SiCl₄ addition for SiC-CVD from MTS/H₂ (U. Tokyo) *(Stu)Otaka Yuhei, (Stu)Aji Ryosuke, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	CVD SiC Recycle	ST-22	556
	K215	Manufacture of SiC_f/SiC by chlorine-free Chemical Vapor Infiltration (U. Tokyo) *(Stu)Aji Ryosuke, (Stu)Otaka Yuhei, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	SiC chemical vapor infiltration tetramethylsilane	ST-22	822
	K216	Production and Characterization of Organic Thin Films by Rapid Expansion of Supercritical Solutions (RESS) Using CO₂ (Kanazawa U.) *(Stu)Sakamoto Y., Kobayashi T., Kiyosawa T., (Stu)Kamata W., (Reg)Uchida H.	RESS Organic thin films Supercritical CO2	ST-22	781

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SCEJ 51st Autumn Meeting (2020)

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