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SCEJ 51st Autumn Meeting (2020)

Program search result : プラズマ : 9 programs

All sessions can be attended from the On-line (Virtual) Meeting Site.
Preprints(Abstracts) are now open. Click the Paper IDs. (Registered participants and invited persons only)
The ID/PW was sent on Sept. 10 (for earlybird registered participants) or on Sept. 23 (for on-site registered participants).
(Aug. 8) Flash session of SY-69 has been cancelled.
(Aug. 24,27) Schedule of SY-74 (X306, X307) and HQ-11 (D301) has been changed.

Title (J) field includes “プラズマ”; 9 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

TimePaper
ID		Title / AuthorsKeywordsTopic codeAck.
number
Day 1
9:40– 10:00		J103Effect of microwave irradiation position on fluidized bed type microwave plasma assisted combustor
(Kyushu U.) *(Stu)Imamura Yuichiro, (Reg)Yamamoto Tsuyoshi, (Reg)Kishida Masahiro
microwave plasma
fluidized Bed
plasma-assisted combustion
SY-56386
Day 2
11:00– 11:20		M207(B, N, or P)-doped Carbon Nanoparticles Synthesized by Solution Plasma Process, and its application to Metal-Air Rechargeable Battery.
(Kindai U.) *(Stu)Imamura Ryota, Okamura Tomoya, (Kindai U.) Sugimoto Ryoya, (Stu)Sakuragi Takahisa, (Stu)Matsusako Shunsuke, (Waseda U.) Jia Junjun, (Kindai U.) Yuasa Masayoshi, Nishida Tetsuaki, (Reg)Oka Nobuto
Solution Plasma Process
Carbon Nanoparticles
Metal-Air Rechargeble Battery
ST-21789
Day 2
11:20– 11:40		M208High-speed camera observation of arc fluctuation in water thermal plasma with tunable mist generation
(Kyushu U.) *(Stu)Murakami Hiiro, Kim Soonho, Munekata Hiroki, (Reg)Tanaka Manabu, (Reg)Watanabe Takayuki
thermal plasma
water plasma
arc fluctuation
ST-21331
Day 2
11:20– 12:00		K208[Review lecture] Future Prospects of Plasma Deposition Technology
(Tohoku U. NICHe) Goto Tetsuya
plasma enhanced deposition
plasma equipment design
reactive species control
ST-22110
Day 2
11:40– 12:00		M209Gas permeation properties and structure control of molecular sieve silica membranes prepared using AP-PECVD
(Hiroshima U.) *(Stu·PCEF)Noborio Takuji, (Reg)Nagasawa Hiroki, (Reg)Kanezashi Masakoto, (Reg)Tsuru Toshinori
atmospheric plasma
chemical vapor deposition
silica membrane
ST-21337
Day 2
13:00– 13:40		M213[Review lecture] Overview of pulsed power and plasma applications in agriculture and food processing
(Iwate U.) Takaki Koichi
agriculture
plasma
pulsed power
ST-21537
Day 2
13:20– 13:40		F214Structural study on activated carbon prepared by extremely fast activation with microwave-induced plasma
(Kyoto U.) *(Stu)Kuptajit Purichaya, (Reg)Sano Noriaki, (Reg)Nakagawa Kyuya, (Reg)Suzuki Tetsuo
activated carbon
microwave plasma
fast activation
SY-78832
Day 3
13:00– 13:20		K313[Invited lecture] Characterization of silicon and nitrogen doped diamond-like carbon thin films prepared by plasma-enhanced chemical vapor deposition
(Hirosaki U.) Nakazawa Hideki
diamond-like carbon
plasma-enhanced chemical vapor deposition
silicon
ST-22248
Day 3
13:20– 13:40		K314Residual stress in gas barrier silica film prepared by plasma chemical vapor deposition
(Kyoto U.) *(Reg)Kawase M., (Stu)Hirata S., (Stu)Wakisaka T.
CVD
Residual stress
Silica gas barrier film
ST-2213

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SCEJ 51st Autumn Meeting (2020)

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