SCEJ 80th Annual Meeting (Tokyo, 2015): List of the applications (topics)

`SCEJ 80th Annual Meeting (Tokyo, 2015)`

List of received applications (By topics code)

11) Electronics

11-c. Micro-processing (Etching, Thin film, etc.)

Most recent update: 2015-07-10 15:24:01

The keywords that frequently used in this toopics code.	Keywords	Number
	polymer	1
	electron beam resist	1

ACKN No.	Title/Author(s)	Keywords	Style
417	Synthesis of new electron beam resist polymer and its supersensitivity (Miyakonojo NCT) *Hirohama Syo, Iwakuma Minako, (Kumamoto U.) Kunitake Masashi, (Yamaguchi U.) Ikeda Shingo, Kishimura Yukiko, Asada Hironori, (gluon lab.) Hoshino Ryouici	electron beam resist polymer	P

List of received applications (By topics code)

List of received applications
SCEJ 80th Annual Meeting (Tokyo, 2015)

(C) 2015 The Society of Chemical Engineers, Japan. The Society of Chemical Engineers, Japan. All rights reserved.
Most recent update: 2015-07-10 15:24:01
For more information contact Organizing Committee, SCEJ 80th Annual Meeting (Tokyo, 2015)
E-mail: inquiry-80a

www3.scej.org

This page was generated by