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$BIt2q%;%C%7%g%s(B SE-11. <$BG.J*
(9:00$B!A(B10:00) ($B:BD9(B $B:4Gl(B $BN4!&A0@n(B $B=!B'(B)
9:00$B!A(B 9:20O101$BFs
($B?@8MBg1!9)(B) ($B3X(B)$B!{B$B!&(B ($B?@8MBg<+A3(B) ($B@5(B)$BF|=P4V(B $B$k$j(B$B!&(B ($B?@8MBg1!9)(B) ($B@5(B)$BNkLZ(B $BMN(B$B!&(B ($B@5(B)$B8VED(B $B1YG7(B
two-dimensional flow
velocity field
energy transfer
SE-11730
9:20$B!A(B 9:40O102$B%^%$%/%m5^=L>.5^3HBgN.O)Cf$N%3!<%J!<124Q;!$K$h$k%R%"%k%m%s;@MO1U$NCF@-IT0BDj$N2r@O(B
($B?@8MBg<+A3(B) ($B@5(B)$B!{F|=P4V(B $B$k$j(B$B!&(B ($B?@8MBg1!9)(B) $B2,(B $BBY5,(B$B!&(B ($B@5(B)$BNkLZ(B $BMN(B$B!&(B ($B@5(B)$B8VED(B $B1YG7(B
Elastic instability
Hyaluronate solution
SE-11657
9:40$B!A(B 10:00O103$B6J$,$j$rM-$9$k6k7A4I$K$*$1$k5^<}=L5^3HBg05NOB;<:$N?tCM2r@O(B
($B:j(B $B=(;J(B$B!&(B $BDG(B $BJ]9,(B$B!&(B ($B7'Bg(B) $B@n:j(B $BM:B@O:(B$B!&(B ($B%0%m!<%V%i%$%I(B) $BCf4V(B $BAv(B
Sudden Expansion
Sudden Contraction
Pressure Loss
SE-11302
(10:00$B!A(B11:00) ($B:BD9(B $BNkLZ(B $BMN!&Bg@n86(B $B??0l(B)
10:00$B!A(B 10:20O104$B3&LL3h@-:^?eMO1U$K$h$kDq93Dc8:N.$l$N2D;k2=$HN.$l9=B$$N%b%G%k2=(B
($B;38}Bg1!(B) ($B3X(B)$B!{;3K\(B $B=WLi(B$B!&(B $B=EB<(B $BCR;K(B$B!&(B $B>.NS(B $B<~J?(B$B!&(B ($B@5(B)$B:4Gl(B $BN4(B
Drag Reduction
Surfactant
Flow Visualization
SE-11839
10:20$B!A(B 10:40O105$B3&LL3h@-:^$K$h$kIwGH$N8:?j:nMQ(B
($B5~Bg1!(B) ($B3X(B)$B!{LZB<(B $B8|;W(B$B!&(B $B;0NX(B $B>-Li(B$B!&(B ($B5~Bg9)(B) ($B@5(B)$B9b3@(B $BD>>0(B$B!&(B ($B@5(B)$B9u@%(B $BNI0l(B$B!&(B ($B@5(B)$B>.?9(B $B8g(B
Wave damping
surfactant
fluid
SE-11102
10:40$B!A(B 11:00O106$B6bLV$HB?9&HD$K$h$j7A@.$5$l$k1UN.$N(BPIV$B7WB,(B
($BJ!2,Bg(B) ($B@5(B)$B!{Fb;3(B $B905,(B$B!&(B $B?9ED(B $B=_(B$B!&(B $B:4F#(B $BN$B!&(B ($B@5(B)$B>>7((B $BMN2p(B$B!&(B $B0f
PIV
Hot film anemometer
Flow visualization
SE-11911
(11:00$B!A(B12:00) ($B:BD9(B $B>.?9(B $B8g!&A0@n(B $B=!B'(B)
11:00$B!A(B 11:20O107Front-Tracking$BK!$K$h$k%l%$%j!
($B:k6LBg1!(B) ($B3X(B)$B!{CfEg(B $BNKB@(B$B!&(B ($B@5(B)$BK\4V(B $B=S;J(B$B!&(B ($B@5(B)$B8E4W(B $BFsO:(B
Rayleigh-Taylor Instability
Front-Tracking Method
Numerical simulation
SE-11396
11:20$B!A(B 11:40O108$B>F7k%,%i%9%S!<%:B?9&BN$X$N1UE)?;=a$N?tCM2r@O(B
($BJ!2,Bg9)(B) ($B3X(B)$B!{5WJ]@n(B $BM*@8(B$B!&(B ($B3X(B)$BEZED(B $B>-?M(B$B!&(B ($B@5(B)$BFb;3(B $B905,(B$B!&(B ($B@5(B)$B>>7((B $BMN2p(B
packed bed
penetration
Lattice Boltzmann method
SE-11138
11:40$B!A(B 12:00O109$BHy:YN.O)Fb$N5$1U<+M33&LL>e$KM65/$7$?%^%i%s%4%KBPN.$N2D;k2=$H$=$NB.EY7WB,(B
($B$B!&(B ($B$B!&(B ($B3X(B)$BEgLn(B $BB@5.(B$B!&(B ($B.Ln(B $BD>
Marangoni effect
PIV
Capillary channel
SE-11723
(13:00$B!A(B13:40) ($B;J2q(B $B4dED(B $B=$0l(B)
13:00$B!A(B 13:40O113[$B>7BT9V1i(B] $BD62;GH%I%C%W%i!<%l%*%a%H%j!<$N3+H/(B
($BKLBg1!9)(B) $B!{B<0f(B $BM40l(B$B!&(B $BED:d(B $BM5;J(B$B!&(B $BGrD;(B $B5.5W(B
Ultrasound
Doppler
Rheometry
SE-1130
(13:40$B!A(B14:20) ($B;J2q(B $BC+8}(B $B5.;V(B)
13:40$B!A(B 14:20O115[$B>7BT9V1i(B] $B$;$sCGN.$*$h$SEE>l2<$K$*$1$kHsAjMO9bJ,;R%V%l%s%I$N(B3$B
($BKLBg1!9)(B) $B@^86(B $B9((B
Immiscible polymer blend
Three-dimensional structure
Rheology
SE-1188
(14:20$B!A(B15:00) ($B:BD9(B $BBg@n86(B $B??0l!&A0@n(B $B=!B'(B)
14:20$B!A(B 14:40O117$BK'9aB2%"%_%I%*%$%k%2%k2=:^(B; PMDA$B$N%l%*%m%8!%*%$%kJ,;67O$N0BDj2=(B
($B;38}Bg1!(B) ($B3X(B)$B!{M-ED(B $BBYJe(B$B!&(B $B0KF#(B $BKaH~(B$B!&(B ($B@5(B)$B:4Gl(B $BN4(B$B!&(B ($B%@%$%;%k(B) ($BK!(B)$B:d@>(B $BM50l(B$B!&(B ($B%3%9%b@PL}%k%V%j%+%s%D(B) $B;{Fb(B $BN4Fs(B$B!&(B $BFJLZ(B $B90(B$B!&(B $BEOJU(B $B2B5W(B
Organogelator
Rheology
Stability
SE-11856
14:40$B!A(B 15:00O118$BN.DL7O05NO?6F0C&K"K!$K$*$1$k05NO?6F00u2CIt$N8!F$(B
($BL>9)Bg1!(B) ($B3X(B)$B!{?e1[(B $B:L2C(B$B!&(B ($B@5(B)$B4dED(B $B=$0l(B$B!&(B ($B@5(B)$B?9(B $B=($B!&(B ($B@5(B)$BFn1@(B $BN<(B
defoaming
pressure-oscillation
shear-thinning fluid
SE-11463
(15:00$B!A(B16:00) ($B:BD9(B $B>>7((B $BMN2p!&Bg@n86(B $B??0l(B)
15:00$B!A(B 15:20O119$B%i%0%i%s%8%eE*
($BElBg1!9)(B) ($B3X(B)$B!{9bH*(B $BOBLo(B$B!&(B ($B3X(B)$BB9(B $B6G>>(B$B!&(B ($B@5(B)$B
MPS
phase transition
heat transfer
SE-11612
15:20$B!A(B 15:40O120$B29EY:9$HG;EY:9$K5/0x$9$k%^%i%s%4%KBPN.$N6&B88z2L$K$h$kBPN.9=B$0MB8@-$K4X$9$k?tCM2r@O(B
($BN0Bg9)(B) ($B@5(B)$B!{?e8}(B $B>0(B$B!&(B ($BN0Bg1!M}9)(B) $B@>LC(B $B9'51(B$B!&(B $B5HLn(B $BC#Li(B$B!&(B ($B:eBg1!4p9)(B) ($B@5(B)$B2,Ln(B $BBYB'(B
Marangoni convection
Floating zone technique
Si/Ge
SE-11617
15:40$B!A(B 16:00O121Development of a new contact model for adhesive particles in the discrete particle simulation
(U. Tokyo) ($B3X(B)$B!{(BBasinskas G.$B!&(B ($B@5(B)Sakai M.
adhesive contact model
discrete element method
SE-11118
(16:00$B!A(B17:00) ($B:BD9(B $B?e8}(B $B>0!&A0@n(B $B=!B'(B)
16:00$B!A(B 16:20O122$BDlLLCf1{$+$i$N%(%"%l!<%7%g%s$r$H$b$J$&6k7AMF4oFb$K$*$1$k5$1UFsAjN.$N?tCM2r@O(B
($B2,;3M}Bg1!(B) ($B3X(B)$B!{;38}(B $BB@0l(B$B!&(B ($B2,;3M}Bg(B) ($B@5(B)$BJ?Ln(B $BGnG7(B$B!&(B ($B@5(B)$B7,LZ(B $B8-Li(B
Gas-Liquid flow
Two Phase Flow
Numerical Simulation
SE-11832
16:20$B!A(B 16:40O123$B05=L;E;v$rMW$7$J$$>J%(%M>xN1%7%9%F%`$NG.$*$h$S>xN1FC@-(B
($B4X@>2=3X(B) ($B@5(B)$B!{JR2,(B $BK.IW(B$B!&(B ($B@5(B)$BLnED(B $B=(IW(B$B!&(B ($B@5(B)$B8~ED(B $BCi90(B$B!&(B ($BK!(B)$B@>B<(B $B8aNI(B$B!&(B ($B@5(B)$B;3O)(B $B42;J(B
HIDiC
Energy conservation
Ethanol distillation
SE-11319
16:40$B!A(B 17:00O124$BMf@{7?%_%K%A%c%M%k$K$h$kAFN3$NJ,N%!&J,5i(B
($BEl9)Bg1!M}9)(B) ($B3X(B)$B!{6b>k(B $B>!Bg(B$B!&(B ($B@5(B)$BBg@n86(B $B??0l(B$B!&(B ($B@5(B)$B5H@n(B $B;KO:(B
Coarse particle separation/classification
Spiral mini-channel
CFD
SE-11491

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(9:20$B!A(B10:40) ($B:BD9(B $BIpED(B $BOB9((B)
9:20$B!A(B 9:40O202$B0BA4It2q(BWG$B%F!<%^$H%7%s%]%8%&%`
($BEl9)Bg(B) ($B@5(B)$B^
Process Safety Management
Lifecycle Safety
Research Theme
SY-291
9:40$B!A(B 10:00O203$B;v8N;vNc$X$N%a%H%j%/%9$N3hMQ$K8~$1$F(B
($BN)L?4[Bg(BMOT) ($B@5(B)$B@D;3(B $BFX(B
Process Safety Management
Lagging Metrics
SY-2674
10:00$B!A(B 10:20O204$B@_HwJ]A4(BWG$BJs9p=q$N35MW(B
($BEl9)Bg(B) ($B@5(B)$B^
Plant Maintenance
Business Process Model
Technology Requirement Specification
SY-292
10:20$B!A(B 10:40O205$B%W%m%;%9(B/$B%W%i%s%H@_7W$K$D$J$,$k%W%m%;%9%1%_%9%H%j!<(B
($BG@9)Bg(B) ($B@5(B)$BKLEg(B $BDwFs(B
Process Chemistry
Process/Plant Design Engineering
Business Process Model
SY-2423
(10:40$B!A(B12:00) ($B:BD9(B $B@D;3(B $BFX(B)
10:40$B!A(B 11:00O206$B%W%m%;%90BA4>pJs$N3hMQ(B
($B0B1R8&(B) ($B@5(B)$BEgED(B $B9T63(B
Process Safety Information
Process Safety Management
Plant Lifecycle
SY-2196
11:00$B!A(B 11:20O207$B;v8N2r@O%,%$%I%i%$%s:n@.(BWG$B$N7W2h(B
($BEl9)Bg(B) ($B@5(B)$B^
Incident Investigation
Process Hazard Analysis
Lifecycle Engineering
SY-2183
11:20$B!A(B 11:40O208$B2=3X;:6H;v8ND4::Js9p=q$K$*$1$k0BA4J82=(B
($B7DXf(BSDM) ($B@5(B)$B1'Ln(B $B8&0l(B
Safety Culture
Chemical Industry
Accident
SY-2314
11:40$B!A(B 12:00O209$B9TF0FC@-$NGD0.$G;v8NKI;_(B
($B00>K;R(B) ($BK!(B)$BFn@n(B $BCiCK(B
Process Safety
SY-245
$BIt2q%7%s%]%8%&%`(B SY-9. <CVD$B!&%I%i%$%W%m%;%9!!!]9=B$!&5!G=@)8f$NH?1~9)3X!](B>
(13:00$B!A(B14:00) ($B:BD9(B $B6LCV(B $BD>
13:00$B!A(B 13:40O213[$BE8K>9V1i(B] 3D$B%a%b%j;~Be$N%W%m%;%95;=QE8K>(B
($BEl
semiconductor fabrication
process technology
3D memory
SY-9129
13:40$B!A(B 14:00O215$BD6NW3&MOBN$N29EY8{G[$rMxMQ$7$?%"%s%H%i%;%s@=Kl$K$*$1$k2aK0OBEY$*$h$SG;EY$N1F6A(B
($BElBg1!9)(B) ($B3X(B)$B!{K-AR(B $B>MB@(B$B!&(B ($B@5(B)$B2<;3(B $BM52p(B$B!&(B ($B@5(B)$BAz3@(B $B9,9@(B$B!&(B ($B@5(B)$BI4@%(B $B7r(B
Supercritical CO2
anthracene
crystallization
SY-9156
(14:00$B!A(B15:00) ($B:BD9(B $B2O@%(B $B85L@(B)
14:00$B!A(B 14:20O216$B%3%s%U%)!<%^%k$JD6NW3&N.BNBO@Q$K$*$1$k(BCO2$B05NO$N1F6A(B
($BElBg1!9)(B) ($B3X(B)$B!{%A%g%&(B $B%f%&(B$B!&(B ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B@5(B)$B2<;3(B $BM52p(B$B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
supercritical fluid deposition
pressure
kinetics
SY-9543
14:20$B!A(B 14:40O217$BD6NW3&MOBN5^B.KDD%K!$K$h$k(BTIPS$B%Z%s%?%;%sGvKlAO@=$HM-5!GvKl%H%i%s%8%9%?$NFC@-I>2A(B
($B?.=#Bg1!M}9)(B) ($B3X(B)$B!{2FL\(B $B$B!&(B ($B3X(B)$B9b66(B $BM$BA(B$B!&(B ($B?.=#Bg1!Am9)(B) ($B3X(B)$BF#0f(B $BN5Li(B$B!&(B ($B?.=#Bg9)(B) ($B@5(B)$BFbED(B $BGn5W(B
Supercritical carbon dioxide
TIPS-pentacene thin films
Organic thin film transistor (OTFT)
SY-9668
14:40$B!A(B 15:00O218$BD6NW3&Fs;@2=C:AG$rMQ$$$?;@2=E4GvKl$N:n@.(B
($B:eI\Bg1!(B) ($B3X(B)$B!{3Q(B $B2E?M(B$B!&(B ($B:eI\Bg(B) ($B3X(B)$BEaG)(B $B@5Mx(B$B!&(B ($B:eI\Bg1!(B) ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B$B!&(B ($B@5(B)$B6aF#(B $BOBIW(B$B!&(B ($BElKLBgB?858&(B) ($B@5(B)$B9b8+(B $B@?0l(B
supercritical CO2
FeRAM
iron oxide
SY-9758
(15:00$B!A(B16:00) ($B:BD9(B $B2<;3(B $BM52p(B)
15:00$B!A(B 15:20O219[$B>7BT9V1i(B] $B9b05(BCO2$BE:2C$K$h$kG4EYDc2<$rMxMQ$7$?9b05J.L8@.Kl5;=Q(B
($B;:Am8&!&2=3X%W%m%;%98&5fItLg(B) $B!{@nyu(B $B?50lO/(B$B!&(B ($BElKLBg(B) $BNkLZ(B $BL@(B
high pressure carbon dioxide
spray deposition
viscosity
SY-9131
15:20$B!A(B 15:40O220$BD6NW3&N.BN$rMQ$$$?(BTiO2$B%J%N:Y9&$X$N(BCuInS2$BKd$a9~$_@.Kl(B
($BElKLBgB?858&(B) ($B3X(B)$B!{0B0f(B $BMFFs(B$B!&(B ($B3X(B)$BCf0B(B $BM4B@(B$B!&(B ($BElBg9)(B) ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($BElKLBgB?858&(B) ($B@5(B)$Bcx5o(B $B9bL@(B$B!&(B ($B@5(B)$BK\4V(B $B3J(B
supercritical fluid deposition
nanostructure
compound semiconductor
SY-9442
15:40$B!A(B 16:00O221$B%W%i%:%^(BCVD$BK!$rMQ$$$?%7%j%+7O%,%9%P%j%"Kl$N:n@=$H%,%9F)2aB.EY$NB,Dj(B
($B5~Bg9)(B) ($B3X(B·$B5;4p(B)$B!{BgDE(B $B7<9,(B$B!&(B ($B3X(B)$BC]ED(B $B0M2C(B$B!&(B ($B@5(B)$B2O@%(B $B85L@(B
plasma CVD
silica-based film
gas barrier
SY-9757
(16:00$B!A(B17:00) ($B:BD9(B $B1)?<(B $BEy(B)
16:00$B!A(B 16:20O222$B%W%i%:%^(BCVD$BK!$G:n@=$7$?%7%j%+Kl$N2=3X9=B$$HKlFC@-(B
($B5~Bg9)(B) ($B3X(B)$B!{C]ED(B $B0M2C(B$B!&(B ($B3X(B)$B=P8}(B $BMx$B!&(B ($B3X(B·$B5;4p(B)$BBgDE(B $B7<9,(B$B!&(B ($B@5(B)$B2O@%(B $B85L@(B
plasma CVD
chemical structure
film properties
SY-9815
16:20$B!A(B 16:40O223$B0[$J$kC:AG8;$rMQ$$$?%W%i%:%^(BCVD$B$K$h$k%+!<%\%s%J%N%&%)!<%k$N9g@.$H$=$NFC@-I>2A(B
($BEl9)Bg1!M}9)(B) ($B3X(B)$B!{?7@n(B $BBg$B!&(B ($B@5(B)$B?9(B $B?-2p(B
carbon nanowall
carbon monoxide
SY-9897
16:40$B!A(B 17:00O224$B%0%i%U%'%s$N
($BAaBg1!@h?JM}9)(B) ($B3X(B)$B!{Bg@n(B $BD+M[(B$B!&(B ($B@5(B)$BD9C+@n(B $B3>(B$B!&(B ($B@5(B)$BLnED(B $BM%(B
Graphene
Chemical vapor deposition
Nucleation and growth
SY-9605

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(9:00$B!A(B10:00) ($B:BD9(B $BCSED(B $B7=(B)
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reactivity analysis
fine trench
Chemical Vapor Deposition
SY-9861
9:20$B!A(B 9:40O302$BD69b%"%9%Z%/%HHf%_%/%m%-%c%S%F%#$rMQ$$$?(BSiC-CVI$BK!$N%b%G%j%s%0(B
($BElBg1!9)(B) ($B3X(B)$B!{Eh(B $B9IJ?(B$B!&(B ($B3X(B)$B:4F#(B $BEP(B$B!&(B ($B3X(B)$BgULg(B $BM$0l(B$B!&(B $B?y1:(B $B=(=S(B$B!&(B ($B3X(B)$BCf86(B $BBsLi(B$B!&(B (IHI$B4pHW8&(B) ($B@5(B)$BJ!Eg(B $B9/G7(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
CVD
SiC
methyltrichlorosilane
SY-9747
9:40$B!A(B 10:00O303$B86NAC:2=?eAG
($B5~Bg9)(B) ($B3X(B·$B5;4p(B)$B!{GO>l(B $BfFJ?(B$B!&(B ($B3X(B)$B4d0f(B $BK-I'(B$B!&(B ($B3X(B)$BD9ED(B $BfF(B$B!&(B ($B@5(B)$B2O@%(B $B85L@(B
CVD
Pyrolysis
Carbon
SY-9278
(10:00$B!A(B11:00) ($B:BD9(B $B?9(B $B?-2p(B)
10:00$B!A(B 10:20O304$BF3F~%,%9$r@Z$jBX$($k(BCVD$B%W%m%;%9$NHsDj>o%,%9N.$l%7%_%e%l!<%7%g%s(B
($B%"%F%J%7%9(B) ($B@5(B)$BCSED(B $B7=(B
CVD
ALD
simulation
SY-9608
10:20$B!A(B 10:40O305SiHCl3$B$K$h$k%7%j%3%s@.Kl;~$NI{@8@.J*7A@.5!9=(B
($B2#9qBg1!9)(B) $B:y0f(B $B$"$f$_(B$B!&(B $Bc7F#(B $B$"$fH~(B$B!&(B ($B@5(B)$B!{1)?<(B $BEy(B
Silicon epitaxial growth
trichlorosilane
by-products
SY-911
10:40$B!A(B 11:00O306$B1vAG(B-$B%1%$AG4^2=9gJ*$rMQ$$$?(BCVD$B$G$N2
($BElBg1!9)(B) ($B3X(B)$B!{:4F#(B $BEP(B$B!&(B ($B3X(B)$BEh(B $B9IJ?(B$B!&(B ($B3X(B)$BgULg(B $BM$0l(B$B!&(B $B?y1:(B $B=(=S(B$B!&(B ($B3X(B)$BCf86(B $BBsLi(B$B!&(B (IHI$B4pHW8&(B) ($B@5(B)$BJ!Eg(B $B9/G7(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B3X0L$B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B
silicon-chlorine compounds
by-products
elementary reaction simulation
SY-9840
(11:00$B!A(B12:00) ($B:BD9(B $BAz3@(B $B9,9@(B)
11:00$B!A(B 11:20O307$BM-5!H>F3BN:`NA>:2Z@:@=%W%m%;%9$N2r@O(B
($BElBg1!9)(B) ($B3X(B)$B!{4dCK(B $BBs:H(B$B!&(B ($B@5(B)$B;38}(B $BM34tIW(B$B!&(B ($BElBg4D0B%;(B/$BElBg1!9)(B) ($B@5(B)$BDT(B $B2B;R(B
sublimation
purification
organic semiconductors
SY-9468
11:20$B!A(B 11:40O308$B5$AjK!$K$h$k(BAg-TiO2$B%J%NN3;R:.9gBO@QKl$N:n@=(B
($B9-Bg1!9)(B) ($B3X(B·$B5;4p(B)$B!{A}ED(B $B1Q9b(B$B!&(B $BED0f(B $BM*2p(B$B!&(B ($B@5(B)$B5WJ](B $BM%(B$B!&(B ($B@5(B)$BEgED(B $B3X(B
PECVD
Nanoparticle synthesis
PVD
SY-9273
11:40$B!A(B 12:00O309[$B>7BT9V1i(B] $BH>F3BN%W%m%;%9MQM-5!6bB086NA$N@_7W!"9g@.$*$h$S(BALD$B$X$NE,MQ(B
($B%(%"!&%j%-!<%I(B) Dussarrat Christian
atomic layer deposition
conformal growth
reaction mechanism
SY-9132
(13:00$B!A(B14:00) ($B:BD9(B $BLnED(B $BM%(B)
13:00$B!A(B 13:40O313[$BE8K>9V1i(B] $B2=9gJ*H>F3BN%J%N%o%$%d$N%X%F%m%(%T%?%-%7%c%k@.D9$HE8K>(B
($BKLBgNL;R=8@Q%(%l%/%H%m%K%/%98&5f%;(B) $B!{IZ2,(B $B9n9-(B$B!&(B $BK\5W(B $B=g0l(B$B!&(B $BJ!0f(B $B9';V(B
compound semiconductor
nanowire
heteroepitaxial growth
SY-9128
13:40$B!A(B 14:00O315$BG.(BCVD $BK!$G:n@=$7$?;@2=0!1tGvKl$NFC@-(B
($BEl3$Bg1!9)(B) ($B3X(B)$B!{9uED(B $B?88c(B$B!&(B ($BEl3$Bg9)(B) $B5WJ](B $B;K9a(B$B!&(B $B2#;3(B $BM%5.(B$B!&(B $BEOn5(B $B2m=S(B$B!&(B ($BEl3$Bg1!9)(B) $BBg5WJ](B $BC#@8(B$B!&(B ($B@5(B)$B=);3(B $BBY?-(B
CVD
Zinc oxide
transparent conductive film
SY-9767
(14:00$B!A(B15:00) ($B:BD9(B $B=);3(B $BBY?-(B)
14:00$B!A(B 14:20O316$B0[$J$k;@AG05NO$G:n@=$7$?F3EE@-;@2=J*EE6K$rM-$9$k6/M6EEBN%-%c%Q%7%?$NEE5$FC@-(B
($B:eI\Bg1!9)(B) ($B3X(B)$B!{9bED(B $B`v;R(B$B!&(B ($B3X(B)$BE7Ln(B $BBY2O(B$B!&(B ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B$B!&(B ($B@5(B)$B6aF#(B $BOBIW(B$B!&(B $B5HB<(B $BIp(B$B!&(B $BF#B<(B $B5*J8(B$B!&(B ($B:eBg;:8&(B) $BHu8}(B $B9(Fs(B$B!&(B $BKLEg(B $B>4(B
Ferroelectric capacitor
pulsed laser deposition
oxygen pressure
SY-9645
14:20$B!A(B 14:40O317p$B7?%@%$%d%b%s%I>e$K(BEB$B>xCeK!$G7A@.$7$?(BTi$B2=9gJ*(B/Pt/Au$BEE6K$N(BTLM$BI>2A(B
($B:eI\Bg1!9)(B) ($B3X(B)$B!{NkLZ(B $BAo0lO:(B$B!&(B ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B$B!&(B ($B@5(B)$B6aF#(B $BOBIW(B$B!&(B ($B;:Am8&(B) $B>>K\(B $BMc(B$B!&(B $BKRLn(B $B=S@2(B$B!&(B $B>.AR(B $B@/I'(B$B!&(B $B2CF#(B $BCh8w(B$B!&(B $BC]Fb(B $BBgJe(B$B!&(B $B;3:j(B $BAo(B$B!&(B $BBg6z(B $B=(@$(B
diamond
contact resistance
electron beam evaporated
SY-9787
14:40$B!A(B 15:00O318[$B>7BT9V1i(B] $BCb2=J*GvKl$NHy:Y9=B$@)8f$H%i%8%+%k$rMQ$$$?Dc29$G$N@.KlJ}K!(B
($BKL8+9)Bg(B) $B!{Ip;3(B $B??5](B$B!&(B $B:4F#(B $B>!(B$B!&(B $BLnLp(B $B8|(B
nitride thin film
sputtering
radical nitridization
SY-9130
(15:00$B!A(B15:40) ($B:BD9(B $BsnF#(B $B>f{J(B)
15:00$B!A(B 15:20O319$B5^B.>xCe$H$=$N>lMOM;7k>=2=$K$h$kBgN37B7k>=(BSi$BGvKl:n@=K!$N3+H/(B
($BAaBg@h?JM}9)(B) ($B3X(B)$B!{;3:j(B $BM*J?(B$B!&(B ($B@5(B)$BD9C+@n(B $B3>(B$B!&(B ($B@5(B)$BBgBt(B $BMxCK(B$B!&(B ($B@5(B)$BLnED(B $BM%(B
crystalline silicon thin films
vapor deposition
liquid phase crystallization
SY-9643
15:20$B!A(B 15:40O320CVD$B$K$h$k&A(B-Al2O3$BGvKl$NG[8~@-@)8f(B
($BElBg9)(B) ($B3X(B)$B!{@>_7(B $B7E(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B5~%;%i(B) $BC+^<(B $B1I?N(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B
CVD
Al2O3
crystal-orientation
SY-9827
$B9V1iH/I=%W%m%0%i%`(B
$B2=3X9)3X2q(B $BBh(B47$B2s=)5(Bg2q(B
(C) 2015 $B8x1W
Most recent update: 2015-08-26 10:00:42
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