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SCEJ 50th Autumn Meeting (Kagoshima, 2018)

Last modified: 2018-09-04 10:00:00

Program search result : 秋山 泰伸 : 5 programs

The abstracts can be viewed by clicking the Paper IDs.
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)

Authors and Chairs (J) field exact matches “秋山 泰伸”; 5 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
10:4012:00
PA104Resistivity of aluminum-doped zinc oxide thin film prepared by low pressure CVD
(Tokai U.) *(Stu)Negishi Kousuke, (Reg)Akiyama Yasunobu
CVD
Al-dope zinc oxide
resisitivity
SY-65826
Day 1
13:0014:40
PA104Resistivity of aluminum-doped zinc oxide thin film prepared by low pressure CVD
(Tokai U.) *(Stu)Negishi Kousuke, (Reg)Akiyama Yasunobu
CVD
Al-dope zinc oxide
resisitivity
SY-65826
Day 2
9:1011:10
PA240Fabrication of photonic crystal with polystyrene fine particles
(Tokai U.) *(Stu)Iwase Kei, (Reg)Akiyama Yasunobu
photonic crystal
polystyrene particles
SY-80825
Day 3
11:4012:00
CD309Lithium-doped Zinc Oxide thin film's relative permittivity by LPCVD Method
(Tokai U.) *(Stu)Takemoto Satoshi, (Reg)Akiyama Yasunobu
CVD
Lithium-doped Zinc Oxide
Ferroelectric
ST-25832
Day 3
13:0014:00
   Chair: Akiyama Yasunobu
CD313[Review lecture] Thin film deposition and surface modification using species generated by catalytic decomposed reaction: Foundations and applications of HWCVD method
(Kyutech) Izumi Akira
HWCVD
Thin film
Surface modification
ST-25243
CD315Analysis of reaction kinetics of SiO2 atomic layer deposition with aminosilane-gases
(TTS) *(Reg)Kawakami M., Kagaya M., Mitsunari T., Sato J., Yabe K.
ALD
aminosilane
reaction kinetics
ST-25226

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SCEJ 50th Autumn Meeting (Kagoshima, 2018)


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