Habuka Hitoshi - Program search result - SCEJ 51st Autumn Meeting (2020)

`SCEJ 51st Autumn Meeting (2020)`

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Program search result : Habuka Hitoshi : 6 programs

All sessions can be attended from the On-line (Virtual) Meeting Site.
Preprints(Abstracts) are now open. Click the Paper IDs. (Registered participants and invited persons only)
The ID/PW was sent on Sept. 10 (for earlybird registered participants) or on Sept. 23 (for on-site registered participants).
(Aug. 8) Flash session of SY-69 has been cancelled.
(Aug. 24,27) Schedule of SY-74 (X306, X307) and HQ-11 (D301) has been changed.

Authors field exact matches “Habuka Hitoshi”; 6 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Day 1 9:00– 10:20	Chair: Habuka Hitoshi
	B101	Electrodeposition of bismuth thin film as negative electrode for Mg secondary battery (Osaka Pref. U.) *(Stu)Narumoto Natsuki, (Reg)Okamoto Naoki, (Reg)Saito Takeyasu	Mg secondary ion battery bismuth electrodeposition	SY-77	888
	B102	Discharge-Charge Characteristics of Aluminum-Sulfur Secondary Batteries using Sulfur Electrode with Multi-Walled Carbon Nanotubes (Iwate U.) Ui Koichi, *Iwabuchi Taisei, Fujishima Ryo, Rahman Md. Mijanur, Takeguchi Tatsuya, (Osaka U.) Uemura Yuya, Tsuda Tetsuya	Alminum Secondary Battery Sulfur Electrode Multi-Walled Carbon Nanotubes	SY-77	817
	B103	Aluminum Electrodeposition Using hydrophobic TFSA-Based Room-Temperature Ionic Liquids (Iwate U.) Ui Koichi, *Kono Makoto, Rahman Md. Mijanur, Takeguchi Tatsuya, (Osaka U.) Tsuda Tetsuya	electrochemical deposition room-temperature ionic liquid aluminum	SY-77	836
	B104	Electrochemical Characteristics of Lithium-Ion Batteries Using a Negative Electrode with Graphene Oxide Nanoribbons (Iwate U.) Ui Koichi, *Kawabata Keito, Md. Mijanur Rahman, Takeguchi Tatsuya, (Chang Gung U.) Sun Chia-Liang	Lithium-Ion Batteries Graphene Oxide Nanoribbons Negative Electrode	SY-77	821
Day 1 11:00– 11:20	B107	SiC etching rate and profile adjusted by ClF3 gas (Yokohama Nat. U.) Irikura Kenta, Hayashi Masaya, *(Reg)Habuka Hitoshi, (Kanto Denka Kogyo) (Cor)Takahashi Yoshinao, (AIST) Kato Tomohisa	SiC ClF3 Etching	SY-77	63
Day 1 15:00– 15:40	Chair: Habuka Hitoshi
Day 1 15:00– 15:40	B119	[Invited lecture] Flexible Hybrid Electronics: Fundamentals and Potential Applications (Yamagata U.) *Tokito Shizuo, Nishikawa Takao, Shiba Takeo	JISSO Tohoku Smart electronics	SP-1	867
Day 3 9:00– 10:20	Chair: Noda Suguru, Habuka Hitoshi
	K301	Continuous synthesis of carbon nanoparticle-nanotube composite by high-temperature pyrolysis of acetylene (Waseda U.) *(Stu)Urata Yua, Otahara Ryoya, (Reg)Osawa Toshio, (Reg)Sugime Hisashi, (Denka) Nako Yuki, Okada Takuya, (Waseda U.) (Reg)Noda Suguru	Carbon nanoparticle Carbon nanotube CVD	ST-22	175
	K302	Fabrication and hierarchical structure control of carbon nanotube electron field emitter for X-ray tube (Waseda U.) *(Stu)Yasui Kotaro, Kitagawa Sae, (Reg)Sugime Hisashi, (Meidensha) Ochi Hayato, Takahashi Daizo, (Waseda U.) (Reg)Noda Suguru	carbon nanotube electron field emitter hierarchical structure control	ST-22	230
	K303	ZnO coating of carbon nanotubes by in-flight PECVD method (Hiroshima U.) *(Stu)Yoshitake Haruki, (Stu)Hemanth Lakshmipura R., (Reg)Kubo Masaru, (Reg)Shimada Manabu	plasma-enhanced chemical vapor deposition nanocoating aerosol	ST-22	310
	K304	QCM for evaluating gas flow in Minimal-CVD reactor (Yokohama Nat. U.) Otani Mana, *(Reg)Habuka Hitoshi, (Minimal Fab) Ikeda Shin-ichi, Ishida Yuuki, Hara Shiro	CVD QCM Minimal	ST-22	62
Day 3 10:00– 10:20	K304	QCM for evaluating gas flow in Minimal-CVD reactor (Yokohama Nat. U.) Otani Mana, *(Reg)Habuka Hitoshi, (Minimal Fab) Ikeda Shin-ichi, Ishida Yuuki, Hara Shiro	CVD QCM Minimal	ST-22	62
Day 3 10:40– 12:00	Chair: Habuka Hitoshi
	K306	Reaction mechanism analysis of polycrystalline SiC-CVD for high-speed, uniform growth process design (U. Tokyo) *(Stu)Oku T., (Reg)Deura M., (Reg)Momose T., (Reg)Shimogaki Y.	Reaction model SiC CVD	ST-22	499
	K307	Time-evolution of film thickness profiles by level set method during CVD multiscale simulation (U. Tokyo) *(Stu)Zhang Jin, (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	multiscale simulation chemical vapor deposition level set method	ST-22	504
	K308	[Review lecture] Concept, design and future of semi-batch type ALD equipment and process (TTS) *Katoh Hitoshi, Seshimo Yuji	ALD Equipment Semi-Batch	ST-22	111

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SCEJ 51st Autumn Meeting (2020)

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