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SCEJ 84th Annual Meeting (Tokyo, 2019)

Last modified: 2019-03-12 11:30:00

Program search result : 新規製造 : 2 programs

The preprints(abstracts) can be viewed by clicking the Paper IDs.
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)
The programs of HC-13, HC-17, K-1 were updated.

Title (J) field includes “新規製造”; 2 programs are found.
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
13:0013:20
I113Safe Preparation and Utilization of Highly Reactive Active Species I -Development and Applications of New Production Equipment for The Aqueous of Stabilized Hypochlorous Acid-
(TMCIT) *(Reg)Tamura Kenji, (Ena) Akutsu Toshin
Hypochlorous Acid
pH Value
Effective Chlorine Concentration
10-h1145
Day 3
9:2011:20
PD378Development of the manufacturing process of high purity LiOH・H2O using acetic acid and lithium carbonate
(Kansai U.) *(Stu)Jonoshita Akinori, (Reg)Yamamoto Hideki
LiOH
Crystallization
Li
4-g1298

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SCEJ 84th Annual Meeting (Tokyo, 2019)


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