Last modified: 2020-03-02 11:00:00
Authors field exact matches “Wakisaka T.”; 1 program is found.
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Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
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Day 3 | J316 | Residual stress in gas barrier silica film prepared by plasma chemical vapor deposition | CVD residual stress silica gas barrier film | 5-h | 608 |
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SCEJ 85th Annual Meeting (2020)