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SCEJ 86th Annual Meeting (2021)

Program search result : 塩素 : 3 programs

The preprints(abstracts) are now open (Mar. 8th). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants (excludes free registration) and invited persons are required.

Title (J) field includes “塩素”; 3 programs are found.
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
14:2015:20
PA128Development of chlorine-free SiC-CVI process to achieve uniform infiltration without particle generation
(U. Tokyo) *(Stu)Kondo Yoshifumi, (Stu)Aji Ryosuke, (Stu)Otaka Yuhei, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
CVI
CVD
5-h506
Day 1
16:2016:40
N123ClF3 gas distributor design for SiC wafer etching
(Yokohama Nat. U.) Hayashi Masaya, *(Reg)Habuka Hitoshi, (Kanto Denka Kogyo) (Cor)Takahashi Yoshinao, (AIST) Kato Tomohisa
SiC
Wafer etching
CLF3 gas
11-c43
Day 3
9:4010:00
E303[Requested talk] Some examples of degradation of polyvinyl chloride by sodium hypochlorite
(Sumitomo Chemical) (Reg)Nakada Mikitoshi
oxidative degradation
PVC
sodium hypochlorite
F-1670

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SCEJ 86th Annual Meeting (2021)


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