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SCEJ 86th Annual Meeting (2021)

Program search result : CVD : 5 programs

The preprints(abstracts) are now open (Mar. 8th). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants (excludes free registration) and invited persons are required.

Keywords field exact matches “CVD”; 5 programs are found.
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
12:4013:00
J112Development of silica membrane having thermal stability prepared by counter diffusion CVD
(RITE) *(Reg)Urai Hiromi, (Reg)Seshimo Masahiro, Yamaguchi Yuichiro, (Reg)Nakao Shin-ichi
CVD
Silica membrane
thermal stability
4-a228
Day 1
13:2014:20
PA139Spectoroscopy of plasma emisson during film deposition in HMDSO/AR PE-CVD
(Gifu U.) *(Stu)Kuboniwa A., Komiyama M., (Reg)Nishida S.
CVD
film
plasma
5-h24
Day 1
14:2015:20
PA128Development of chlorine-free SiC-CVI process to achieve uniform infiltration without particle generation
(U. Tokyo) *(Stu)Kondo Yoshifumi, (Stu)Aji Ryosuke, (Stu)Otaka Yuhei, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
CVI
CVD
5-h506
Day 3
14:2014:40
K317Conformal growth of SiC onto trenches by CVI from MTS/H2 with using quasi-0th-order reaction and sacrificial layer
(U. Tokyo) *(Stu)Otaka Yuhei, (Reg)Sato Noboru, (Stu)Kondo Yoshifumi, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
CVD
CVI
5-h383
Day 3
15:0015:20
K319Si-B film formation using boron trichloride and dichlorosilane gases
(Yokohama Nat. U.) Otani Mana, Muroi Mitsuko, *(Reg)Habuka Hitoshi
Silicon-boron
CVD
BCL3
5-h42

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SCEJ 86th Annual Meeting (2021)


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