Habuka Hitoshi - Program search result - SCEJ 53rd Autumn Meeting (Nagano, 2022)

`SCEJ 53rd Autumn Meeting (Nagano, 2022)`

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Program search result : Habuka Hitoshi : 6 programs

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Authors field exact matches “Habuka Hitoshi”; 6 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Day 1 13:00– 15:00	Chair: Kawakami Masato, Habuka Hitoshi
	DJ113	[Review lecture] Improvement of prediction accuracy of W-ALD deposition rate by machine learning (TTS) *Aita Michitaka, Yamasaki Hideaki, Hotta Takanobu, Kawaguchi Takuya, Narushima Kensaku, Kubo Atsushi, Mochizuki Seiichiro, Takagi Toshio	Machine Learning ALD Simulation	ST-24	221
	DJ115	Examination of Co-ALD process using CCTBA (U. Tokyo) *(Stu)Yamaguchi Jun, (Reg)Sato Noboru, Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	ALD cobalt CCTBA	ST-24	617
	DJ116	[Featured presentation] Boron Doping Method using BCl3 gas for Silicon Minimal CVD (Yokohama Nat. U.) Kamochi Yuki, *(Reg)Habuka Hitoshi, (Minimal Fab./AIST) Ikeda Shin-ichi, Ishida Yuuki, Hara Shiro	Minimal Fab Silicon CVD Boron Doping	ST-24	9
	DJ117	Study of estimating vapor pressure of metal complex with COSMO-SAC method (U. Tokyo) *(Reg)Sato Noboru, (Stu)Yamaguchi Jun, (Stu)Wu Yuxuan, Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	vapor pressure metal complex COSMO-SAC	ST-24	686
	DJ118	Functional protective film coating method by vacuum ultraviolet light irradiation (Gifu U.) *(Stu)Yokoi Akino, (Reg)Hayakawa Yukio, (Reg)Kambara Shinji	Vacuum ultraviolet light Polymer coating Surface modification	ST-24	237
Day 1 14:00– 14:20	DJ116	[Featured presentation] Boron Doping Method using BCl3 gas for Silicon Minimal CVD (Yokohama Nat. U.) Kamochi Yuki, *(Reg)Habuka Hitoshi, (Minimal Fab./AIST) Ikeda Shin-ichi, Ishida Yuuki, Hara Shiro	Minimal Fab Silicon CVD Boron Doping	ST-24	9
Day 3 13:00– 13:40	Chair: Habuka Hitoshi, Iwamoto Takeshi
Day 3 13:00– 13:40	BB313	[Review lecture] Equipment and technology of CMP for semiconductor device wafers (EBARA) (Cor)Hiyama Hirokuni	CMP Semiconductor device Equipment	SY-76	65
Day 3 14:20– 14:40	Chair: Habuka Hitoshi, Iwamoto Takeshi
Day 3 14:20– 14:40	BB317	Morphology control of Bi anode for rechargeable magnesium battery and its charge/discharge characteristics (Osaka Metro. U.) *(Stu)Matsumoto Amane, Narumoto Natsuki, (Reg)Okamoto Naoki, (Reg)Saito Takeyasu	electrodeposition rechargeable magnesium battery	SY-76	763
Day 3 15:00– 15:20	BB319	Water Flow Improved by Side Wall Pinhole Outlets of Silicon Wafer Wet Cleaning Bath (Yokohama Nat. U.) Tsuchida Toko, Takahashi Toshinori, *(Reg)Habuka Hitoshi, (Pre-Tech) Goto Akihiro	Silicon wafer Wet cleaning bath Water flow	SY-76	7
Day 3 15:20– 16:00	Chair: Habuka Hitoshi, Saito Takeyasu
	BB320	[Invited lecture] Liquid crystal-polymer hybrid devices and their applications (Akita U.) Yamaguchi Rumiko	Liquid crystal Polymer Hybrid device	SY-76	62
	BB321	[Invited lecture] Heat and resource recirculation by thermoelectric power generation (AIST) *Funahashi Ryoji, Mikami Masashi	Resource recirculation Thermoelectric power generation Heat recirculation	SY-76	63

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SCEJ 53rd Autumn Meeting (Nagano, 2022)

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