ST-24. [Trans-Division Symposium] CVD, ALD and Dry Processes

Organizer(s): Nishida Satoshi (Gifu Univ.), Momose Takeshi (Kumamoto Univ.), Shimizu Hideharu (Taiyo Nippon Sanso)

Most recent update: 2024-04-11 13:19:01

The keywords that frequently used
in this topics code.
KeywordsNumber
ALD4*
CVD3*
Chemical vapor deposition2
PECVD2
CVI2
sputtering2
SiC2
cobalt2
photocatalyst1

ACKN
No.
Title/Author(s)KeywordsStyle
76Production of silicon-carbon composite materials by chemical vapor deposition for negative electrode of lithium-ion battery
(Waseda U.) *(Stu,PCEF)Oka Junya, (Reg)Osawa Toshio, (Reg)Noda Suguru
Chemical Vapor Deposition (CVD)
Silicon
Lithium-ion battery
O
94Precursor interactions for SiCx$N$y$O$z plasma-enhanced chemical vapor deposition at room temperature
(Yokohama Nat. U.) Kawakami Hiroki, Hori Kenta, Watanabe Toru, *(Reg)Habuka Hitoshi
SiCNO
PECVD
Interaction
O
150[Review lecture] Current Status and Future Prospects of Hard Coatings for Cutting Tools by Chemical Vapor Deposition
(Kyocera) (Cor)Tanibuchi Takahito
CVD
Cutting tool
Hard coating
O
168Feed of Gaseous Boron Source Using Solid Boron and Water Vapor and Synthesis of Boron Nitride Nanotubes via Template Coating Method
(Waseda U.) *(Stu,PCEF)Kaida Takazumi, Takahashi Hiromu, (Reg)Li Mochen, (Reg)Osawa Toshio, (Reg)Noda Suguru
Boron Nitride Nanotube (BNNT)
Template coating method
Boron oxide
O
229Low temperature CVD process development for AlN thin films for 3DICs.
(U. Tokyo) *(Stu)Obara S., Ninomiya T., Takagi T., (Reg)Momose T., (Reg)Shimogaki Y.
AlN film
chemical vapor deposition
low temperature
O
255Rate analysis of coke deposition from hydrocarbons with different degrees of unsaturation
(Kyoto U.) *(Stu)Nakano Shinji, (Reg)Fujitsuka Hiroyasu, (Reg)Kawase Motoaki
coking
CVD
Carbon
O
304Development of low-resistivity copper thin film formation process on polymer by supercritical fluid thin film deposition method
(U. Tokyo) *(Stu)Nakajima Yusuke, (Reg)Shimogaki Yukihiro, (U. Tokyo/Kumamoto U) (Reg)Momose Takeshi
SCFD
Polymer
resistivity
O
344Development of damage-less dry-purification of carbon nanotubes using Br2 vapor
(Waseda U.) *(Stu,PCEF)Goto Takuma, (Reg)Osawa Toshio, (Reg)Noda Suguru
Carbon nanotube
Purification
Bromine vapor
O
423DFT study on reaction paths of AlN growth by MOCVD
(Kyoto U.) *(Stu)Li Yafei, (Reg)Kawase Motoaki
DFT
AlN
MOCVD
O
425Morphology Improvement of Chemical Vapor Deposited Bismuth-based Perovskite Thin Film for Photovoltaic Use
(Kyoto U.) *(Int)Yang Ziguang, (Stu)Togami Keito, (Stu)Tanabe Maika, (Reg)Kawase Motoaki
Chemical vapor deposition
Methylammonium bismuth iodide
Molten bismuth
O
518[Invited lecture] Development of Epitaxial Growth for High Performance SiC Power Devices
(Mitsubishi Electric) Tanaka Takanori
Silicon carbide
Power device
Epitaxial growth
O
705In-situ Quartz Crystal Microbalance Measurement of Adsorption for Trimethylaluminum
(U. Tokyo) *(Stu)Wu Yuxuan, (Stu)Liu Haonan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
ALD
QCM
Adsorption
O
778Photocatalytic Performance Evaluation of TiO2$ and TiO$2-CuO Nanoparticulate Thin Films Prepared by a Gas Phase System
(Hiroshima U.) *(Stu)Hudandini Meditha, (ITS, Indonesia) Kusdianto K., (Hiroshima U.) (Reg)Kubo Masaru, (Reg)Shimada Manabu
PECVD
PVD
TiO2-CuO heterojunction
O
783[Invited lecture] Structure and morphology control in thin films by using sputtering
(Kyushu U.) Itagaki Naho
sputtering
thin film
morphology control
O
814[Review lecture] R&D Trend and Future Prospect of 3D LSI Chip Stacking Technology
(Kumamoto U.) Aoyagi Masahiro
3D-IC
chip stacking
TSV
O
824Improvement of COSMO-SAC method for estimating vapor pressure of metal complex
(U. Tokyo) *(Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
COSMO-SAC
metal complex
vapor pressure
O
837Examination of selective deposition process by Co-ALD
(U. Tokyo) *(Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
cobalt
ALD
selective deposition
O
843Investigation of high-speed impregnation conditions using high-concentration hydrogen supply in SiC-CVI process
(U. Tokyo) *(Stu)Kimura Shunsuke, (Stu)Otaka Yuhei, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
CVI
CVD
O
845Development of Molybdenum Atomic Layer Deposition Process for Next Generation ULSI Interconnect
(U. Tokyo) *(Stu)Liu Haonan, (Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
ALD
Molybdenum
interconnect
O
862Detailed study of the effect of SiCl4$ addition to SiC-CVI by MTS/H$2
(U. Tokyo) *(Stu)Otaka Yuhei, (Reg)Sato Noboru, (Stu)Kimura Shunsuke, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
CVI
MTS
O
876Evaluation of the Physical Properties of Reactive sputtered MAX alloy thin films
(Osaka Metro. U.) *(Stu,PCEF)Ueda Kazuki, Wakamatsu Kazunobu, (Reg)Saito Takeyasu, (Reg)Okamoto Naoki
sputtering
MAX-phase
O
895Observation of the initial process of Cobalt film growth using variations in reflected light intensity.
(U. Tokyo) *(Stu)Kimura Shunsuke, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
cobalt
ALD
reflectance
O
926Investigation of visible light responsive CuOx$/TiO$2 photocatalytic reaction mechanism using model catalyst structure
(U. Tokyo) *(Stu)Tanaka Jun, (Stu)Nakajima Yusuke, (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi
photocatalyst
visible light
reaction mechanism
O

List of received applications (By topics code)

List of received applications
SCEJ 54th Autumn Meeting (Fukuoka, 2023)

Most recent update: 2024-04-11 13:19:01
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