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SCEJ 56th Autumn Meeting
Sep. 16 (Tue) - 18 (Thu), 2025
Toyosu Campus, Shibaura Institute of Technology
Japanese page
Most recent update: 2025-12-05 14:48:01
 The keywords that frequently used in this topics code. | Keywords | Number | |
|---|---|---|---|
| ALD | 4 |  | |
| Atomic Layer Deposition | 4 | | |
| CVD | 3 | | |
| Neural network potential | 2 | | |
| Flame spray pyrolysis | 1 | | |
| ACKN No. | Title/Author(s) | Keywords | Style |
|---|---|---|---|
| 6 | Rate process of SiCxNyOz deposition by room temperature PECVD | PECVD rate process | O |
| 270 | Development of a method for simultaneous measurement of saturated solubility and diffusion coefficient of organometallic compounds in high-temperature supercritical CO2/H2 | Supercritical Fluid Deposition saturation solubility diffusion coefficient | O |
| 277 | Carbon deposition during dry reforming of CH4 on Ni catalysts prepared by flame synthesis | Flame spray pyrolysis Ni catalysts Dry reforming of methane | O |
| 285 | [Invited lecture] Development of carbon and carbon composite materials with a tailored nanostructure using CVD techniques | CVD Carbon | O |
| 305 | Investigation of the Growth Enhancement Effect of Pd on Co-ALD | Nucleation enhancer ALD ULSI | O |
| 336 | Temperature Dependence of TMA Adsorption Kinetics in Al2O3 Atomic Layer Deposition | Atomic Layer Depositon Quartz Crystal Microbalance Surface Adsorption | O |
| 338 | TMA/NH3-based FM-CVD Process for High-Thermal-Conductivity AlN Films at 400 oC | FM-CVD 3DIC AlN | O |
| 347 | Molecular dynamics simulations of precursor adsorption in the Co-ALD process using neural network potentials | Atomic layer deposition Neural network potential Growth per cycle | O |
| 405 | Reaction Mechanism Analysis of Mo-CVD/ALD using Mo(CO)6 | Mo(CO)6 step coverage interconnect | O |
| 537 | Accurate Estimation of Surface Reaction Rate Constants in SiC-CVD via Neural Network Potentials | SiC CVD Neural network potential | O |
| 606 | [Invited lecture] Development of precursors and deposition processes for atomic layer deposition | Atomic Layer Deposition Precursor ABC-type ALD | O |
| 672 | Evaluation of gas detection characteristics of TiO2 nanoparticulate thin films fabricated in gas phase | gas sensor aerosol particle deposition plasma CVD | O |
| 726 | Computation of Al2O3 ALD by trimethylaluminum with Kinetic Monte Carlo and neural network potential | ALD KMC NNP | O |
| 731 | [Invited lecture] Synthesis of silica membranes using atmospheric-pressure plasma and their application in gas separation | plasma CVD gas separation | O |
| 740 | Investigation of alkyl chain length dependence of inhibitors for area selective deposition of HfO2 | Area selective deposition Inhibitor | O |
| 743 | [Review lecture] The Potential of Quantum Computing in Chemical Reaction Analysis | chemical reaction quantum computer quantum computing | O |
| 801 | Steric Hindrance Effects and Reaction Kinetics in Co-ALD Using CCTBA Precursor | ALD Atomic Layer Deposition | O |
| 806 | Evaluation of the Effects of Wall Adsorption and Transport Phenomena on QCM-Based Adsorption Kinetics Analysis in ALD | ALD Atomic Layer Deposition QCM | O |
| 888 | Growth Dynamics of Bismuth-Based Perovskite Thin Films via Chemical Vapor Deposition | Chemical vapor deposition Perovskite solar cell crystal orientation control | O |
| 914 | Deposition characteristics of TiSiCN by DC plasma CVD | DC plasma CVD TiSiCN | O |
| 944 | CH4/CO2 reforming for production of H2-Rich gas and CNT: Influence of H2S and H2O | catalyst carbon nanotube biogas | O |
Organizing Committee of SCEJ 56th Autumn Meeting (2025)
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