$B2O@%(B $B85L@!J5~ETBg3X!K!&6LCV(B $BD> |
CVD$BEy$N%I%i%$%W%m%;%9$O%(%l%/%H%m%K%/%9!$B@M[EECS!$(BMEMS$B!$5!G=@-%3!<%F%#%s%0Ey$NJ,Ln$K$*$$$F=EMW$J4p445;=Q$H$J$C$F$$$k!#K\%7%s%]%8%&%`$G$O!$(BCVD$B$H(BALD$B$=$NB>$N%I%i%$%W%m%;%9$rMxMQ$7$?GvKl7A@.!$HyN3;R9g@.!$Hy:Y2C9)$K$*$$$FH?1~9)3XE*8+CO$h$jH?1~%a%+%K%:%`$rM}2r$7!$O@M}E*$G8zN(E*$JH?1~%W%m%;%9$dH?1~AuCV$N3+H/$rL\;X$75DO@$9$k$3$H$rL\E*$H$7$^$9!#$J$*!$M%=($JH/I=$r$5$l$?
$B:G=*99?7F|;~!'(B2022-01-31 16:50:01
$B$3$NJ,N`$G$h$/;H$o$l(B $B$F$$$k%-!<%o!<%I(B | $B%-!<%o!<%I(B | $B | |
---|---|---|---|
CVD | 5$B7o(B | ||
CVI | 2$B7o(B | ||
Numerical simulation | 2$B7o(B | ||
Chemical Vapor Deposition | 2$B7o(B | ||
thermal annealing | 1$B7o(B |
$B | $B9V1iBjL\!?H/I=$B%-!<%o!<%I(B | $BH/I=7A<0(B | |
---|---|---|---|
40 | $B;01v2=%[%&AG%,%9$H%b%N%a%A%k%7%i%s%,%9$K$h$kGvKl7A@.(B | Chemical vapor deposition Silicon-Boron film Mechanism | O |
142 | $BD6NW3&N.BNGvKlBO@QK!$G:n@=$7$?;@2=%A%?%s$N8w?(G^3h@-$H7k>=@-$X$NE:2CJ*$N8z2L(B | supercritical fluid deposition photocatalyst crystallinity | O |
154 | One-step fabrication of CuO-loaded TiO2 nanoparticulate thin film for photocatalytic application under visible light irradiation | PECVD-PVD nanocomposite heterojunction | O |
375 | $B%S%9%^%9$r86NA$H$7$?B@M[EECSMQ%Z%m%V%9%+%$%HGvKl(BCVD$B%W%m%;%9$N3+H/(B | CVD perovskite methylammonium bismuth iodide | O |
514 | [$BE8K>9V1i(B] $BH?1~@-%W%i%:%^$rMQ$$$?%J%NN3;R$N@.D9@)8f$H$=$N1~MQE83+(B | CVD nano-particles growth control | O |
516 | [$B>7BT9V1i(B] $BD9<\!&9bL)%+!<%\%s%J%N%A%e!<%V(B(CNT)$B!&%"%l%$$+$i:n@=$9$k(BCNT$B4%<0KB@S;e$NJ*@-@)8f$H%(%M%k%.! | Carbon nanotube (CNT) arrays Dry Spinning CNT yarns Energy and mechanical devices | O |
517 | [$BE8K>9V1i(B] $BH>F3BN%a%b%j$N5;=Q!&7P:Q!&;:6H$N8=:_$HH/E8$9$kL$Mh(B | CVD semiconductor memory industry | O |
519 | [$B>7BT9V1i(B] $B%W%i%:%^>H | CVD plasma numerical simulation | O |
562 | CVI$BK!$rMQ$$$?%;%i%_%C%/%94pJ#9g:`NA@=B$H?1~4oFb$N?tCM%7%_%e%l!<%7%g%s(B | CVI Numerical simulation MTS | O |
594 | $B%Q%k%96!5k(BALD$B$K$*$1$k86NA5$2=FC@-$N8!F$(B | ALD precursor vaporization | O |
629 | $BD6NW3&(BCO2$B$rH?1~>l$H$7$?M-5!=$>~;@2=E4%J%N7k>=$ND>@\9g@.(B | Supercritical carbon dioxide iron oxide nanocrystals organic modification | O |
672 | Enhanced CO2-assisted growth of single-wall carbon nanotube arrays with Fe/AlOx catalyst annealed without CO2 | chemical vaper deposition thermal annealing single-wall carbon nanotubes | O |
689 | SiCf/SiC CMC$B9g@.$N$?$a$NGS=P%,%92~ | SiC reuse CVI | O |
785 | $BM}O@E*8!F$$K4p$E$$$?(BTiAlN-CVD$B%W%m%;%9$K$*$1$k5$AjAGH?1~5!9=9=C[(B | TiAlN CVD Elementary reaction model | O |
792 | $BB?7k>=(BSiC-CVD$B%W%m%;%9@_7W$rL\;X$7$?Am3gH?1~%b%G%k$N9=C[$H8!>Z(B | Chemical Vapor Deposition silicon carbide macrocavity method | O |
863 | Ti[N(CH3)2]4$B$rMQ$$$?%W%i%:%^(BCVD$BK!$K$h$k(BTiCN$BKl$N:n@=(B | plasma CVD TDMAT TiCN | O |
864 | $BF3BNMQG[@~:`NA$H$7$F$N(B MAX$B2=9gJ*$N@=Kl$HI>2A(B | Max Phase semiconductor | O |