S208 - Hall S, Day 2 - Hall and day program - SCEJ 57th Autumn Meeting (Higashihiroshima, 2026)

`SCEJ 57th Autumn Meeting (Higashihiroshima, 2026)`

Last modified: 2026-07-16 06:38:20

Meeting Info.
Program
- Program Menu
- Tech. Sessions
- narrow view
- Prev.Day
- Day 1
- Day 2
- Day 3
By Session
- Session list
- Ceremony
  - Ceremony
- SP: Special
  - SP-1
  - SP-2
  - SP-3
- HQ: HQ Prog.
  - HQ-11
  - HQ-12
  - HQ-13
  - HQ-14
- ST: Trans-Div.
  - ST-21
  - ST-22
  - ST-23
  - ST-24
  - ST-25
  - ST-26
  - ST-27
  - ST-28
  - ST-29
  - ST-30
- SY: 51-59
  - SY-51
  - SY-52
  - SY-53
  - SY-54
  - SY-55
  - SY-56
  - SY-57
  - SY-58
  - SY-59
- SY: 60-69
  - SY-60
  - SY-61
  - SY-62
  - SY-63
  - SY-64
  - SY-65
  - SY-66
  - SY-67
  - SY-68
  - SY-69
- SY: 70-79
  - SY-70
  - SY-71
  - SY-72
  - SY-73
  - SY-74
  - SY-75
  - SY-76
  - SY-77
  - SY-78
  - SY-79
- SY: 80-82
  - SY-80
  - SY-81
  - SY-82
By Hall
- Hall list
- A-L: Bldg. K
  - A: 1F K108
  - B: 1F K107
  - C: 1F K109
  - D: 1F K103
  - E: 1F K110
  - F: 2F K203
  - G: 2F K210
  - H: 2F K211
  - I: 3F K313
  - J: 3F K305
  - K: 3F K314
  - L: 3F K306
- M,N: Bldg. L
  - M: 1F L101
  - N: 2F L201
- P: Fac.Club
- R-Y: Fac.of Eng.
  - R: 102
  - S: 103
  - T: 218
  - U: 107
  - V: 219
  - W: 111
  - X: 220
  - Y: 116
List/Index
Search/Index

Hall and day program : Hall S, Day 2 : S208

The chairs are under negotiation.
Yellow-backs on Technical sessions denote the Hybrid sessions.
(All other sessions are on-site only sessions).

Hall S(103), Day 2(Sep. 15)

SY-75 | SY-76

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
SY-75 [Symposium of Division of Safety] Advanced Process Safety
(9:00–10:00)
9:00– 9:20	S201	Analysis of the Industrial Accidents Caused by Explosions and Fires Using a Fatal Accident Database (JNIOSH) (Reg)Nishiwaki Yosuke	Chemical Safety Industrial accidents analysis	SY-75	90
9:20– 9:40	S202	Age-Related Characteristics of Chemical Substance-Related Explosion and Fire Accidents in the Manufacturing Industry (JNIOSH) *(Reg)Kan Chiemi, (Reg)Nishiwaki Yosuke	Chemical substances Manufacturing industry Age groups	SY-75	267
9:40– 10:00	S203	Preparation of Application Examples of the Reference Materials for Implementing Risk Assessment Based on JNIOSH method (JNIOSH) *(Reg)Sato Yoshihiko, (Reg)Shimada Yukiyasu, (Reg)Nishiwaki Yosuke	Risk assessment Fire and explosion accidents Reactive chemical hazards	SY-75	303
(10:00–10:40)
10:00– 10:40	S204	[Review lecture] Smart Industrial Safety: Evolving with AI (TUAT) (Reg)Yamashita Yoshiyuki	AI DX Smart Industrial Safety	SY-75	259
(10:40–12:00)
10:40– 11:00	S206	[Requested talk] Advancing Smart Industrial Safety with Digital Technologies and AI (Mitsui Chemicals) (Cor)Yasaka Naoto	Smart Industrial Safety Human-AI Collaboration Industrial Data Analytics	SY-75	959
11:00– 11:20	S207	An LLM-Based Scenario Generation Method for Enhancing Incident Response Capabilities Against Cyberattacks (NITech) *(Stu)Konishi Yuta, Koike Hiroto, (Reg)Hamaguchi Takashi, (Reg)Hashimoto Yoshihiro	Incident Response Cyberattack LLM	SY-75	308
11:20– 11:40	S208	Validation of a Value Chain Architecture with CPS Resilience (Fukuoka U.) *(Reg·PCE)Xia J., (JNIOSH) (Reg)Shimada Y., (TUAT) (Reg)Kitajima T.	Value Chain Independent Protection Layer Incident Investigation	SY-75	26
11:40– 12:00	S209	Business Process Model Framework for AI-Enhanced Decision-Making of Safety Management in Chemical Plants (Shizuoka U.) (Reg)Takeda Kazuhiro	Safety Management Decision Making Business Process Model	SY-75	737
SY-76 [Symposium of Division of Electronics] Electronics Materials and Processes
(13:00–14:20)
13:00– 13:40	S213	[Review lecture] The Current Status and Future Prospects of EUVL (U. Hyogo) Watanabe Takeo	EUV Lithography Element technologies of EUVL Next Generation EUVL	SY-76	698
13:40– 14:00	S215	[Invited lecture] Challenges in Wafer Drying Processes and Trends in Pattern Collapse Reduction (Screen Holdings) Nakano Yuui	Pattern collapse Wafer drying	SY-76	637
14:00– 14:20	S216	Cu reduction and OH incorporation to Si insulator by VUV irradiation (Osaka Metro. U.) *(Reg)Saito Takeyasu, Katayama Kaito, Akamatsu Hosei, Endo Shinichi, (Reg)Okamoto Naoki	VUV surface treatment hybrid bonding	SY-76	926
(14:20–15:40)
14:20– 15:00	S217	[Review lecture] Research and development of SiC CMOS integrated circuits and image sensors for extreme environments (Hiroshima U.) Kuroki Shin-Ichiro	SiC CMOS Integrated circuits	SY-76	80
15:00– 15:20	S219	[Invited lecture] Challenges and Recent Advances for the Practical Application of Sulfide All-Solid-State Batteries (AIST) Otoyama Misae	Sulfide All-Solid-State Batteries Solid Electrolytes	SY-76	46
15:20– 15:40	S220	Gas process monitor utilizing quartz crystal microbalance (Yokohama Nat. U.) (Reg)Habuka Hitoshi	quartz crystal microbalance gas process	SY-76	906

DispCtl:	Preferences

Screen preferences
Abstract PDFs view (Not effective until abstract open)
Current window
Open another window
Popup view (fit to width)
Popup view (fit to page)
Download
Link panels to Related/Adjacent pages
Show
No show

Technical program
Technical sessions (Wide) (For narrow screen)
Session programs
Search in technical program
SCEJ 57th Autumn Meeting (Higashihiroshima, 2026)

www4.scej.org