List of received applications (By symposium/topics code)

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5) Chemical reaction engineering

5-h. CVD & dry processes

Most recent update: 2024-12-21 10:44:01

The keywords that frequently used
in this topics code.		KeywordsNumber
CVD3*
SiC2
CVI2
lithium-ion battery2
Mo(CO)61

ACKN
No.		Title/Author(s)KeywordsStyle
238Development of silicon-activated carbon composite anode material by chemical vapor deposition for lithium-ion batteries
(Waseda U.) *(Stu)Arai Soma, (Reg)Mae Tomotaro, (Reg)Osawa Toshio, (Reg)Noda Suguru		Chemical Vapor Deposition (CVD)
Silicon anode
Lithium-ion battery
P
243Synthesis of boron nitride-coated carbon nanotubes and their application to lithium-ion batteries
(Waseda U.) *(Stu)Kitajima Daiki, (Reg)Mae Tomotaro, (Samsung Japan) Beak Jinseok, Hoshiba Koji, (Waseda U.) (Reg)Osawa Toshio, (Reg)Noda Suguru		carbon nanotube
boron nitride
lithium-ion battery
P
247Density Functional Theory Study on Gas Reactions of Trimethylaluminum and Hydrogen for Aluminum Layer Growth
(Kyoto U.) *(Stu)Li Yafei, (Reg)Kawase Motoaki		Aluminum deposition
Density functional theory
MOCVD
O
258Evaluation of AlN film quality and step coverage by FM-CVD
(U. Tokyo) *(Stu)Sato Ritsuki, (Reg)Otaka Yuhei, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		CVD
AlN
3DIC
P
263Adsorption state study of Trimethylaluminum with high-speed atomistic simulator
(U. Tokyo) *(Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		ALD
CVD
Surface Adsorption
O
268Photocatalysis of gas-phase synthesized TiO2 and TiO2+CuO nanoparticulate thin films under various reaction environments
(Hiroshima U.) Hudandini Meditha, (ITS Surabaya) Kusdianto K., (Hiroshima U.) (Reg)Kubo Masaru, *(Reg)Shimada Manabu		PECVD
nanoporous composite
aerosol deposition
O
306Experiment and Numerical Simulation of the SiN Etching Using HF Vapor
(SCREEN SPE) *(Reg)Hoda H., Fujiwara H., Taki T., Taki A., Kuroeda A., Orisaka M.		CFD
Vapor Process
Etching
O
313Study of low-temperature plasma deposition process for Nb thin films
(U. Tokyo) *(Stu)Tanaka Jun, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		niobium
plasma deposition
low-temperature
O
321Kinetic study on surface reactions using neural network potential for the optimal design of CVI process in SiCf/SiC-CMC manufacturing
(U. Tokyo) *(Stu)Yoshida Koki, (Reg)Sato Noboru, (Reg)Otaka Yuhei, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		SiC
CVI
CVD
P
324Molybdenum Atomic Layer Deposition Process Development using Mo(CO)6
(U. Tokyo) *(Stu)Obara Soken, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		Mo(CO)6
low resistivity
good step coverage
O
345Study of ALD process for Pd thin film and substrate dependence
(U. Tokyo) *(Stu)Nagai Souga, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Otaka Yuhei, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		palladium
AS-ALD
growth enhancer
P
430Study of SiC-CVI Initial Growth under Low MTS and High Hydrogen Conditions
(U. Tokyo) *(Stu)Hatakeyama Daiki, (Reg)Otaka Yuhei, (Stu)Yoshida Koki, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		SiC
CVI
CMC
P
461Estimation of surface equilibrium constant and surface reaction rate constant by high-speed atomistic simulator
(U. Tokyo) *(Reg)Sato Noboru, (Stu)Yoshida Koki, (Reg)Otaka Yuhei, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro		machine learned potential
surface kinetics
O
List of received applications (By topics code)
List of received applications
SCEJ 90th Annual Meeting (Tokyo, 2025)

Organizing Committee of SCEJ 90th Annual Meeting (2025)
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