Last modified: 2023-05-16 07:28:20
CVD and other dry processes are core technology in the industry applications for solar cell, electronics devices, MEMS, and functional coatings. This symposium motivates to discuss the logical optimization and design for controlling the microstructure and functions of thin films and fine particles produced by CVD, ALD or other dry processes based on the theoretical understanding of reaction mechanisms. Young Researcher Award will be given to distinguished young speakers chosen at the session.
Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
---|---|---|---|---|---|
Hall VC, Day 1 | |||||
(10:40–12:00) (Chair: | |||||
VC106 | [Review lecture] Semiconductor Memories: Technology, Economy, Industry and Future Growth | CVD semiconductor memory industry | ST-22 | 517 | |
VC108 | Deposition and evaluation of Max Compounds as wiring materials for next-generation semiconductors | Max Phase semiconductor | ST-22 | 864 | |
VC109 | Process development of bismuth-based perovskite CVD for solar cells | CVD perovskite methylammonium bismuth iodide | ST-22 | 375 | |
(13:20–14:40) (Chair: | |||||
VC114 | Direct synthesis of organic modified iron oxide nanocrystals using supercritical CO2 as a reaction field | Supercritical carbon dioxide iron oxide nanocrystals organic modification | ST-22 | 629 | |
VC115 | Effect of additives on photocatalysis and crystallinity of TiO2 made by supercritical fluid deposition | supercritical fluid deposition photocatalyst crystallinity | ST-22 | 142 | |
VC116 | Examination of precursor vaporization characteristics in pulse-supply ALD | ALD precursor vaporization | ST-22 | 594 | |
VC117 | Si-B film deposition from boron trichloride and monomethylsilane gases | Chemical vapor deposition Silicon-Boron film Mechanism | ST-22 | 40 | |
Break | |||||
(15:10–17:00) (Chair: | |||||
VC119 | [Invited lecture] Control of physical properties of CNT yarns spun directly from tall and dense CNT arrays and their application to energy and mechanical devices | Carbon nanotube (CNT) arrays Dry Spinning CNT yarns Energy and mechanical devices | ST-22 | 516 | |
VC121 | [Featured presentation] Enhanced CO2-assisted growth of single-wall carbon nanotube arrays with Fe/AlOx catalyst annealed without CO2 | chemical vaper deposition thermal annealing single-wall carbon nanotubes | ST-22 | 672 | |
VC122 | SiC Infiltration Process Including Exhaust Gas Recycling for SiCf/SiC CMC | SiC reuse CVI | ST-22 | 689 | |
VC123 | Development and validation of overall reaction model for polycrystalline SiC-CVD process design | Chemical Vapor Deposition silicon carbide macrocavity method | ST-22 | 792 | |
VC124 | Numerical simulation of the CVI process in a ceramic matrix composites manufacturing reactor | CVI Numerical simulation MTS | ST-22 | 562 | |
Hall VC, Day 2 | |||||
(9:00–11:40) (Chair: | |||||
VC201 | [Review lecture] Growth control of nano-particles in reactive plasmas and its applications | CVD nano-particles growth control | ST-22 | 514 | |
VC203 | One-step fabrication of CuO-loaded TiO2 nanoparticulate thin film for photocatalytic application under visible light irradiation | PECVD-PVD nanocomposite heterojunction | ST-22 | 154 | |
VC204 | Preparation of TiCN thin film with Ti[N(CH3)2]4 by PACVD | plasma CVD TDMAT TiCN | ST-22 | 863 | |
Break | |||||
VC206 | [Invited lecture] Challenge to simulation of microspace and macrotime structural changes under plasma irradiation | CVD plasma numerical simulation | ST-22 | 519 | |
VC208 | Construction of gas-phase elementary reaction mechanism of TiAlN-CVD based on theoretical study | TiAlN CVD Elementary reaction model | ST-22 | 785 |
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SCEJ 52nd Autumn Meeting (Okayama, 2021)