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SCEJ 54th Autumn Meeting (Fukuoka, 2023)

Program search result : Momose Takeshi : 13 programs

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Authors field exact matches “Momose Takeshi”; 13 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
13:2014:40
   Chair: Momose Takeshi, Nishida Satoshi
S114[Review lecture] R&D Trend and Future Prospect of 3D LSI Chip Stacking Technology
(Kumamoto U.) Aoyagi Masahiro
3D-IC
chip stacking
TSV
ST-24814
S116Development of Molybdenum Atomic Layer Deposition Process for Next Generation ULSI Interconnect
(U. Tokyo) *(Stu)Liu Haonan, (Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
ALD
Molybdenum
interconnect
ST-24845
S117Examination of selective deposition process by Co-ALD
(U. Tokyo) *(Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
cobalt
ALD
selective deposition
ST-24837
Day 1
14:0014:20
S116Development of Molybdenum Atomic Layer Deposition Process for Next Generation ULSI Interconnect
(U. Tokyo) *(Stu)Liu Haonan, (Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
ALD
Molybdenum
interconnect
ST-24845
Day 1
14:2014:40
S117Examination of selective deposition process by Co-ALD
(U. Tokyo) *(Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
cobalt
ALD
selective deposition
ST-24837
Day 1
15:2015:40
S120Low temperature CVD process development for AlN thin films for 3DICs.
(U. Tokyo) *(Stu)Obara S., Ninomiya T., Takagi T., (Reg)Momose T., (Reg)Shimogaki Y.
AlN film
chemical vapor deposition
low temperature
ST-24229
Day 1
16:0016:20
S122Development of low-resistivity copper thin film formation process on polymer by supercritical fluid thin film deposition method
(U. Tokyo) *(Stu)Nakajima Yusuke, (Reg)Shimogaki Yukihiro, (U. Tokyo/Kumamoto U) (Reg)Momose Takeshi
SCFD
Polymer
resistivity
ST-24304
Day 1
16:4017:00
S124In-situ Quartz Crystal Microbalance Measurement of Adsorption for Trimethylaluminum
(U. Tokyo) *(Stu)Wu Yuxuan, (Stu)Liu Haonan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
ALD
QCM
Adsorption
ST-24705
Day 2
9:009:20
S201Observation of the initial process of Cobalt film growth using variations in reflected light intensity.
(U. Tokyo) *(Stu)Kimura Shunsuke, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
cobalt
ALD
reflectance
ST-24895
Day 2
10:4011:00
S206Detailed study of the effect of SiCl4 addition to SiC-CVI by MTS/H2
(U. Tokyo) *(Stu)Otaka Yuhei, (Reg)Sato Noboru, (Stu)Kimura Shunsuke, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
CVI
MTS
ST-24862
Day 2
11:0011:20
S207Investigation of high-speed impregnation conditions using high-concentration hydrogen supply in SiC-CVI process
(U. Tokyo) *(Stu)Kimura Shunsuke, (Stu)Otaka Yuhei, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
CVI
CVD
ST-24843
Day 2
13:0014:20
   Chair: Momose Takeshi, Noda Suguru
S213[Review lecture] Current Status and Future Prospects of Hard Coatings for Cutting Tools by Chemical Vapor Deposition
(Kyocera) (Cor)Tanibuchi Takahito
CVD
Cutting tool
Hard coating
ST-24150
S215DFT study on reaction paths of AlN growth by MOCVD
(Kyoto U.) *(Stu)Li Yafei, (Reg)Kawase Motoaki
DFT
AlN
MOCVD
ST-24423
S216Improvement of COSMO-SAC method for estimating vapor pressure of metal complex
(U. Tokyo) *(Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
COSMO-SAC
metal complex
vapor pressure
ST-24824
Day 2
14:0014:20
S216Improvement of COSMO-SAC method for estimating vapor pressure of metal complex
(U. Tokyo) *(Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
COSMO-SAC
metal complex
vapor pressure
ST-24824
Day 2
14:4015:00
S218Investigation of visible light responsive CuOx/TiO2 photocatalytic reaction mechanism using model catalyst structure
(U. Tokyo) *(Stu)Tanaka Jun, (Stu)Nakajima Yusuke, (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi
photocatalyst
visible light
reaction mechanism
ST-24926
Day 3
13:0014:20
   Chair: Mishima Kenji, Momose Takeshi
Z313Investigation of solid base catalysts applicable for transesterification reactions in sub- and supercritical methanol
(U. Tokyo) *(Reg)Akizuki Makoto, Zhang Mengqi, (Reg)Oshima Yoshito
Sub- and supercritical methanol
Solid base catalyst
Transesterification
SY-73370
Z314Investigation of Polymer Flocculant Extraction Behavior Using Liquefied Dimethyl Ether
(Nagoya U.) *(Reg)Wang T., (Stu)Kusumi K., (Reg)Zhu L., Xu B., (Kyoto U.) Yonezawa R., Homma R., (Nagoya U.) (Reg)Yamamoto T., (Kyoto U.) Shiota K., Takaoka M., Oshita K., (Nagoya U.) (Reg)Kanda H.
Hansen Solubility Parameters
solvent extraction
microalgae
SY-73509
Z315Study on Mass Production of Plant Oil by Liquefied Dimethyl Ether Extraction
(ALBION) *(Reg)Torii Shogo, (Reg)Suzuki Shogo
dimethyl ether
extraction
seed oil
SY-73547
Z316Rate of Alkaline Hydrothermal Defluorination of PFCA
(Chuo U.) (Stu)Endo Jun, *(Reg)Funazukuri Toshitaka
Defluorination
PFCA
Rate
SY-731016

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SCEJ 54th Autumn Meeting (Fukuoka, 2023)


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