
Title (J) field includes “窒化膜評価”; 1 program is found.
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| Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
|---|---|---|---|---|---|
| Day 3 | G304 | Silicon Nitride ALD Process Using High Purity Hydrazine | Siicon Nitride Atomic Layer Deposition Incubation Cycle | 5-h | 109 |
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SCEJ 89th Annual Meeting (Sakai, 2024)
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