J320 - Hall J, Day 3 - Hall and day program - SCEJ 91st Annual Meeting (Kyoto, 2026)

`SCEJ 91st Annual Meeting (Kyoto, 2026)`

Last modified: 2026-01-20 11:12:38

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Hall and day program : Hall J, Day 3 : J320

The chairs are under negotiation.
Yellow-back on the Technical sessions and session list denotes the on-site/virtual hybrid sessions.
All other sessions will be the on-site only sessions.

Hall J(2F 25 ), Day 3(Mar. 19)

8 | 5

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
8. Supercritical fluid
(11:00–11:40)
11:00– 11:20	J307	Development of a prediction model for the partition coefficient in supercritical carbon dioxide extraction (AIST) *(Reg)Fujii Tatsuya, (Reg)Ishizaka Takayuki	Partition coefficient Supercritical carbon dioxide Machine learning	8-c	207
11:20– 11:40	J308	Investigation on treatment conditions for recovery of oils and saccharides from chlorella using hot compressed water (U. Tokyo) *(Reg)Akizuki Makoto, (Stu)Qi Luqing, (Takenaka) (Reg)Kawajiri Satoshi, (U. Tokyo) (Reg)Oshima Yoshito	Hot compressed water Microalgae Reactive extraction	8-d	166
5. Chemical reaction engineering
Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering)
(13:00–14:40)
13:00– 13:20	J313	Supercritical Fluid Deposition (SCFD) Method for Terahertz Wave Device Formation (Kumamoto U.) *(Stu)Uehara Koki, (Reg)Momose Takeshi	Supercritical Fluid Deposition Supecritical Fluid Extraction Copper Deposition on Polymer	5-h	696
13:20– 13:40	J314	Investigation of Rapid and Conformal Conditions for Cu Film Formation using Supercritical Fluid Deposition on High-Aspect-Ratio Structures (Kumamoto U.) *(Stu)Nakamura Arisa, (Stu)Kondo Sumiya, (Stu)Oda Shota, Nishi Yuta, Yokoyama Akira, (Reg)Momose Takeshi	Supercritical Fluid Deposition Copper Deposition High growth rate	5-h	604
13:40– 14:00	J315	Measurement of Surface Reaction Rate Constanst and Adsorption Equilibrium Constants in Supercritical Fluid Deposition of Cu (Kumamoto U.) *(Stu)Kondo Sumiya, (Stu)Oda Shota, (Kumamoto U./U. Tokyo) Nakamura Arisa, (Kumamoto U.) (Reg)Momose Takeshi	Supercritical Fluid Deposition Copper Deposition Langmuir-Hinshelwood reaction kinetics	5-h	684
14:00– 14:20	J316	Process Informatics Framework for Optimal Control in Supercritical Fluid Deposition(1) (Kumamoto U.) *(Stu)Sanai Seitaro, (Stu)Oda Shota, Hashishin Takeshi, Akai Ichiro, (Reg)Momose Takeshi	Process informatics Physsics-informed Bayesian Optimization Supercritical fluid deposition	5-h	592
14:20– 14:40	J317	Process Informatics Framework for Optimal Control in Supercritical Fluid Deposition(2) (Kumamoto U.) *(Stu)Oda Shota, (Stu)Sanai Seitaro, Hashishin Takeshi, Akai Ichiro, (Reg)Momose Takeshi	Process informatics Physics-informed bayesian optimization Supercritical fluid deposition	5-h	603
(15:00–17:20)
15:00– 15:20	J319	Surface reaction mechanism analysis of SiC chemical vapor deposition using Neural Network Potentials (U. Tokyo) *(Stu)Yoshida Koki, (Reg)Otaka Yuhei, (Reg)Sato Noboru, (Reg)Tamaoki Naoki, (Reg)Tsukune Atsuhiro, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Shimogaki Yukihiro	SiC Chemical Vapor Deposition Neural network potential	5-h	639
15:20– 15:40	J320	Validation of reaction models for the SiC-CVD process using Quadrupole Mass Spectrometry (U. Tokyo) *(Stu)Yoshida Koki, (Reg)Otaka Yuhei, (Reg)Sato Noboru, (Reg)Tamaoki Naoki, (Reg)Tsukune Atsuhiro, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Shimogaki Yukihiro	SiC CVD Quadrupole Mass Spectrometry	5-h	672
15:40– 16:00	J321	Investigation of Low-Temperature AlN Deposition and Thermal Conductivity Enhancement by TMA/NH₃-Based FM-CVD (U. Tokyo) *(Reg)Otaka Yuhei, Lu Yin-Chi, (Stu)Hatakeyama Daiki, (Reg)Yamaguchi Jun, (Reg)Tamaoki Naoki, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	AlN CVD 3DIC	5-h	676
16:00– 16:20	J322	Kinetic analysis of CO2-driven ZnO formation using in-situ Raman spectroscopy (Science Tokyo) *(Reg)Orita Yasuhiko, (Stu)Muronosono Aoi, (Reg)Shimoyama Yusuke	In-situ Raman spectroscopy High-pressure CO2 ZnO formation	5-h	202
16:20– 16:40	J323	Control Techniques of selectivity using Hydrazine for SiN-ALD (Kumamoto U./Taiyo Nippon Sanso) *(Stu)Murata Hayato, (Taiyo Nippon Sanso) (Cor)Wada Yoshifumi, (Reg)Shimizu Hideharu, (Kumamoto U.) (Reg)Momose Takeshi	Atomic layer deposition Area selective deposition Hydrazine	5-h	134
16:40– 17:00	J324	Control of a High-Speed Switching Valve for On-Demand Precursor Delivery in ALD (Kumamoto U.) *(Stu)Ishida Kanta, (Kumamoto U./HORIBA STEC) Nishizato Hiroshi, (Kumamoto U.) (Stu)Oda Shota, (HORIBA STEC) Nakaya Yugo, (Kumamoto U.) Nasu Kinichi, Okajima Hiroshi, (Reg)Momose Takeshi	Atomic Layer Deposition Sustainable Valve	5-h	528
17:00– 17:20		CVD reaction subdivision encouragement award ceremony

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SCEJ 91st Annual Meeting (Kyoto, 2026)

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