SCEJ 89th Annual Meeting
March 18 (Mon) - 20 (Wed), 2024
Nakamozu Campus, Osaka Metropolitan University
Japanese page
SCEJ 89th Annual Meeting
March 18 (Mon) - 20 (Wed), 2024
Nakamozu Campus, Osaka Metropolitan University
Japanese page
Most recent update: 2024-08-12 19:59:01
 The keywords that frequently used in this topics code. | Keywords | Number | |
|---|---|---|---|
| Chemical vapor deposition | 3 |  | |
| SiC | 3 | | |
| CVI | 3 | | |
| ALD | 3 | | |
| CVD | 2 | | |
| carbon nanotube | 2 | | |
| TEMAZ | 1 | | |
| ACKN No. | Title/Author(s) | Keywords | Style |
|---|---|---|---|
| 65 | Formation of porous layer, rapid epitaxy, and detachment of monocrystalline Si film on and from monocrystalline Si wafer | Monocrystalline Si film Rapid vapor deposition Porous Si | P |
| 73 | Production of silicon-activated carbon composite materials by chemical vapor deposition for negative electrode of lithium-ion battery | Chemical Vapor Deposition (CVD) Silicon Lithium-ion battery | P |
| 109 | Silicon Nitride ALD Process Using High Purity Hydrazine | Siicon Nitride Atomic Layer Deposition Incubation Cycle | O |
| 123 | Development of Molybdenum Atomic Layer Deposition Process for Next Generation of ULSI Interconnect | Molybdenum ALD low resistivity | O |
| 176 | Development of a dry purification method for carbon nanotubes using a safe etching agent | Carbon nanotubes Purification dry process | P |
| 225 | Stable and continuous synthesis of carbon nanotubes by floating catalyst CVD with fluid mixing control | carbon nanotube chemical vapor deposition continuous process | O |
| 232 | Investigation of Area Selective Co-ALD process utilizing in-situ observation of reflectance intensity. | ALD in-situ observation reflectance | O |
| 233 | Research on improving uniformity in furnace and high speed SiC infiltration in the production of SiC-CMC using Chemical Vapor Infiltration method. | SiC CVI CVD | O |
| 261 | SiOC coating on wood-based material by plasma CVD | PE-CVD water-repellent wood-based material | P |
| 263 | Surface reforming of carbon materials by plasma treatment | plasma carbon materials sem | P |
| 264 | Stable and continuous synthesis of carbon nanotubes by floating catalyst CVD with enhanced decomposition of catalyst sources | carbon nanotube chemical vapor deposition nanoparticle catalyst | P |
| 273 | Study of ZrN thin film formation process using atomic layer deposition | ZrN ALD TEMAZ | O |
| 383 | Quantitative Analysis of Trimethylaluminum Physisorption for ALD | Atomic Layer Depositon Quartz Crystal Microbalance Surface Adsorption | O |
| 422 | Study in evaluation method of silicon texture by alkali etching | solar cell textured MATLAB | P |
| 516 | Investigation of Co Thin Film Thermal Atomic Layer Etching Process | ALE atomic layer eching cobalt | O |
| 531 | Investigation of Continuous Cu Film Formation Process on Polymer | Atomic Layer Depoition Copper on Polymer | O |
| 562 | Reduction of reaction mechanism of SiC-CVI | SiC-CVI CH3SiCl3 Reduced model | O |
| 633 | Exploration of exhaust gas reforming conditions to improve yield and reduce by-product formation in SiC-CVI with high MTS partial pressure | CVI SiC Recycling | O |
| 634 | Strategy for CVI process development in SiCf/SiC-CMC production | CVI SiC Process design | O |
| 683 | CFD Simulation Study on factors influencing AlN compound single crystal growth | MOCVD CFD III-V compound | O |
| 686 | Reaction Rate Equation Determination of Chemical Vapor Deposited Bismuth-based Perovskite Thin Film | Chemical vapor deposition Methylammonium bismuth iodide Perovskite solar cell | O |
| 785 | Rate analysis of carbon CVD from hydrocarbons with different degrees of unsaturation | CVD carbon coking | O |
| 786 | Surface activation of the copper surface by VUV-Redox method using xenon excimer lamp | VUV-Redo Surface activation | O |
| 787 | Evaluation of Reactive sputtered MAX alloy thin films with reducing gas | sputtering MAX-phase | O |
Organizing Committee of SCEJ 89th Annual Meeting (2024)
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