Authors field exact matches “Saito Takeyasu”; 4 programs are found.
The search results are sorted by the start time.
Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
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Day 2 | F202 | Evaluation of Reactive sputtered MAX alloy thin films with reducing gas | sputtering MAX-phase | 5-h | 787 |
Day 2 | Chair: | ||||
K222 | Relation between electrode slurry and battery performance for all solid-state batteries | All solid-state batteries | 11-a | 396 | |
K223 | Study on the pH of electrolyte and anion adsorption in ethanol electro-oxidation reaction | Ethanol electro-oxidation Hydrogen generation Electrolyte | 11-a | 684 | |
Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering) | |||||
Day 3 | Chair: | ||||
G301 | Quantitative Analysis of Trimethylaluminum Physisorption for ALD | Atomic Layer Depositon Quartz Crystal Microbalance Surface Adsorption | 5-h | 383 | |
G302 | Study of ZrN thin film formation process using atomic layer deposition | ZrN ALD TEMAZ | 5-h | 273 | |
G303 | Development of Molybdenum Atomic Layer Deposition Process for Next Generation of ULSI Interconnect | Molybdenum ALD low resistivity | 5-h | 123 | |
G304 | Silicon Nitride ALD Process Using High Purity Hydrazine | Siicon Nitride Atomic Layer Deposition Incubation Cycle | 5-h | 109 | |
G305 | Investigation of Co Thin Film Thermal Atomic Layer Etching Process | ALE atomic layer eching cobalt | 5-h | 516 | |
Day 3 | G308 | Surface activation of the copper surface by VUV-Redox method using xenon excimer lamp | VUV-Redo Surface activation | 5-h | 786 |
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SCEJ 89th Annual Meeting (Sakai, 2024)