Authors field exact matches “Tamaoki Naoki”; 2 programs are found.
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Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
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Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering) | |||||
Day 3 | Chair: | ||||
J313 | Experiment and Numerical Simulation of the SiN Etching Using HF Vapor | CFD Vapor Process Etching | 5-h | 306 | |
J314 | Density Functional Theory Study on Gas Reactions of Trimethylaluminum and Hydrogen for Aluminum Layer Growth | Aluminum deposition Density functional theory MOCVD | 5-h | 247 | |
J315 | Study of low-temperature plasma deposition process for Nb thin films | niobium plasma deposition low-temperature | 5-h | 313 | |
J316 | An evaluation of high temperature processed Bi-based perovskite thin film for photovoltaic application | chemical vapor deposition perovskite solar cells chemical reaction engineering | 5-h | 564 | |
Day 3 | J321 | Evaluation of initial nucleation and growth of Co-ALD | atomic layer deposition initial growth in-situ observation | 5-h | 551 |
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SCEJ 90th Annual Meeting (Tokyo, 2025)