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SCEJ 90th Annual Meeting (Tokyo, 2025)

Program search result : Tamaoki Naoki : 2 programs

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Authors field exact matches “Tamaoki Naoki”; 2 programs are found.
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TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering)
Day 3
13:0014:20
   Chair: Shimada Manabu, Tamaoki Naoki
J313Experiment and Numerical Simulation of the SiN Etching Using HF Vapor
(Screen SPE) *(Reg)Hoda H., Fujiwara H., Taki T., Taki A., Kuroeda A., Orisaka M.
CFD
Vapor Process
Etching
5-h306
J314Density Functional Theory Study on Gas Reactions of Trimethylaluminum and Hydrogen for Aluminum Layer Growth
(Kyoto U.) *(Stu)Li Yafei, (Reg)Kawase Motoaki
Aluminum deposition
Density functional theory
MOCVD
5-h247
J315Study of low-temperature plasma deposition process for Nb thin films
(U. Tokyo) *(Stu)Tanaka Jun, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
niobium
plasma deposition
low-temperature
5-h313
J316An evaluation of high temperature processed Bi-based perovskite thin film for photovoltaic application
(Kyoto U.) *(Int)Yang Ziguang, Maeda Ryo, (Reg)Kawase Motoaki
chemical vapor deposition
perovskite solar cells
chemical reaction engineering
5-h564
Day 3
15:4016:00
J321Evaluation of initial nucleation and growth of Co-ALD
(U. Tokyo) *(Reg)Tamaoki Naoki, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
atomic layer deposition
initial growth
in-situ observation
5-h551
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SCEJ 90th Annual Meeting (Tokyo, 2025)


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