Yamaguchi Jun - Program search result - SCEJ 90th Annual Meeting (Tokyo, 2025)

`SCEJ 90th Annual Meeting (Tokyo, 2025)`

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Program search result : Yamaguchi Jun : 7 programs

The preprints are now open. These can be viewed by clicking the Paper IDs.
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Authors field exact matches “Yamaguchi Jun”; 7 programs are found.
The search results are sorted by the start time.

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Day 1 13:20– 15:20	PA103	Construction of functionalized protein nanomicelles with protein ligation (Science Tokyo) *(Stu)Ogura Yuna, Yamaguchi Jun, (Reg)Nishida Kei, Kobatake Eiry, (Reg)Mie Masayasu	Protein ligation Protein nanomicelle Elastin-like polypeptide	7-a	637
Day 3 9:20– 11:20	PD349	Evaluation of AlN film quality and step coverage by FM-CVD (U. Tokyo) *(Stu)Sato Ritsuki, (Reg)Otaka Yuhei, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	CVD AlN 3DIC	5-h	258
Day 3 9:20– 11:20	PD369	Study of ALD process for Pd thin film and substrate dependence (U. Tokyo) *(Stu)Nagai Souga, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Otaka Yuhei, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	palladium AS-ALD growth enhancer	5-h	345
Day 3 13:40– 14:00	J315	Study of low-temperature plasma deposition process for Nb thin films (U. Tokyo) *(Stu)Tanaka Jun, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	niobium plasma deposition low-temperature	5-h	313
Day 3 15:20– 15:40	J320	Adsorption state study of Trimethylaluminum with neural network potential (U. Tokyo) *(Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	ALD CVD Surface Adsorption	5-h	263
Day 3 15:40– 16:00	J321	Evaluation of initial nucleation and growth of Co-ALD (U. Tokyo) *(Reg)Tamaoki Naoki, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	atomic layer deposition initial growth in-situ observation	5-h	551
Day 3 16:00– 16:20	J322	Molybdenum Atomic Layer Deposition Process Development using Mo(CO)₆ (U. Tokyo) *(Stu)Obara Soken, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	Mo(CO)6 low resistivity good step coverage	5-h	324

Time

Paper
ID

Title / Authors

Keywords

Topic code

Ack.
number

Day 1
13:20– 15:20

PA103

Construction of functionalized protein nanomicelles with protein ligation

(Science Tokyo) *(Stu)Ogura Yuna, Yamaguchi Jun, (Reg)Nishida Kei, Kobatake Eiry, (Reg)Mie Masayasu

Protein ligation
Protein nanomicelle
Elastin-like polypeptide

7-a

637

Day 3
9:20– 11:20

PD349

Evaluation of AlN film quality and step coverage by FM-CVD

(U. Tokyo) *(Stu)Sato Ritsuki, (Reg)Otaka Yuhei, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro

CVD
AlN
3DIC

5-h

258

Day 3
9:20– 11:20

PD369

Study of ALD process for Pd thin film and substrate dependence

(U. Tokyo) *(Stu)Nagai Souga, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Otaka Yuhei, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro

palladium
AS-ALD
growth enhancer

5-h

345

Day 3
13:40– 14:00

J315

Study of low-temperature plasma deposition process for Nb thin films

(U. Tokyo) *(Stu)Tanaka Jun, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro

niobium
plasma deposition
low-temperature

5-h

313

Day 3
15:20– 15:40

J320

Adsorption state study of Trimethylaluminum with neural network potential

(U. Tokyo) *(Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro

ALD
CVD
Surface Adsorption

5-h

263

Day 3
15:40– 16:00

J321

Evaluation of initial nucleation and growth of Co-ALD

(U. Tokyo) *(Reg)Tamaoki Naoki, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro

atomic layer deposition
initial growth
in-situ observation

5-h

551

Day 3
16:00– 16:20

J322

Molybdenum Atomic Layer Deposition Process Development using Mo(CO)₆

(U. Tokyo) *(Stu)Obara Soken, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro

Mo(CO)6
low resistivity
good step coverage

5-h

324

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