J319 - Hall J, Day 3 - Hall and day program - SCEJ 90th Annual Meeting (Tokyo, 2025)

`SCEJ 90th Annual Meeting (Tokyo, 2025)`

Last modified: 2025-01-18 21:45:52

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Hall and day program : Hall J, Day 3 : J319

The chairs are under negotiation.
Yellow-back on the Technical sessions and session list denotes the on-site/virtual hybrid sessions.
All other sessions will be the on-site only sessions.

Hall J(4F 402), Day 3(Mar. 14)

11 | 5

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
11. Electronics
(10:40–11:40)
10:40– 11:00	J306	Dimensionless moduli governing transport phenomenon of polymer electrolyte fuel cell (Kyoto U.) *(Reg)Ma Yulei, (Reg)Hasegawa Shigeki, (Reg)Kageyama Miho, (Reg)Kawase Motoaki	polymer electrolyte fuel cell mass transfer resistance electrochemical reaction engineering	11-a	458
11:00– 11:20	J307	Carbon nanotube/Activated carbon composite for air electrode of Zn-air battery (Kyoto U.) *(Int)Kalong Munsuree, (Reg)Sano Noriaki, Suzuki Tetsuo	Zn-air battery carbon nanotube activated carbon	11-a	573
11:20– 11:40	J308	Investigating the possibility of sintering Cu paste at low temperature (Sumitomo Metal Mining) *(Cor)Toriyama Takahiro, (Cor)Kashiwaya Satoshi	copper sintering complex	11-e	294
5. Chemical reaction engineering
Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering)
(13:00–14:20)
13:00– 13:20	J313	Experiment and Numerical Simulation of the SiN Etching Using HF Vapor (Screen SPE) *(Reg)Hoda H., Fujiwara H., Taki T., Taki A., Kuroeda A., Orisaka M.	CFD Vapor Process Etching	5-h	306
13:20– 13:40	J314	Density Functional Theory Study on Gas Reactions of Trimethylaluminum and Hydrogen for Aluminum Layer Growth (Kyoto U.) *(Stu)Li Yafei, (Reg)Kawase Motoaki	Aluminum deposition Density functional theory MOCVD	5-h	247
13:40– 14:00	J315	Study of low-temperature plasma deposition process for Nb thin films (U. Tokyo) *(Stu)Tanaka Jun, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	niobium plasma deposition low-temperature	5-h	313
14:00– 14:20	J316	An evaluation of high temperature processed Bi-based perovskite thin film for photovoltaic application (Kyoto U.) *(Int)Yang Ziguang, Maeda Ryo, (Reg)Kawase Motoaki	chemical vapor deposition perovskite solar cells chemical reaction engineering	5-h	564
(14:40–16:20)
14:40– 15:00	J318	Photocatalysis of gas-phase synthesized TiO₂ and TiO₂+CuO nanoparticulate thin films under various reaction environments (Hiroshima U.) Hudandini Meditha, (ITS Surabaya) Kusdianto K., (Hiroshima U.) (Reg)Kubo Masaru, *(Reg)Shimada Manabu	PECVD nanoporous composite aerosol deposition	5-h	268
15:00– 15:20	J319	Estimation of surface equilibrium constant and surface reaction rate constant using neural network potential (U. Tokyo) *(Reg)Sato Noboru, (Stu)Yoshida Koki, (Reg)Otaka Yuhei, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	machine learned potential surface kinetics	5-h	461
15:20– 15:40	J320	Adsorption state study of Trimethylaluminum with neural network potential (U. Tokyo) *(Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	ALD CVD Surface Adsorption	5-h	263
15:40– 16:00	J321	Evaluation of initial nucleation and growth of Co-ALD (U. Tokyo) *(Reg)Tamaoki Naoki, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	atomic layer deposition initial growth in-situ observation	5-h	551
16:00– 16:20	J322	Molybdenum Atomic Layer Deposition Process Development using Mo(CO)₆ (U. Tokyo) *(Stu)Obara Soken, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	Mo(CO)6 low resistivity good step coverage	5-h	324
16:20– 16:40		CVD reaction subdivision encouragement award ceremony

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SCEJ 90th Annual Meeting (Tokyo, 2025)

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