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SCEJ 56th Autumn Meeting (Tokyo, 2025)

Program search result : 山口 潤 : 8 programs

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Authors and Chairs (J) field exact matches “山口 潤”; 8 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

TimePaper
ID		Title / AuthorsKeywordsTopic codeAck.
number
Day 1
16:20– 16:40		EE123TMA/NH3-based FM-CVD Process for High-Thermal-Conductivity AlN Films at 400 oC
(U. Tokyo) *(Stu)Hatakeyama Daiki, (Reg)Otaka Yuhei, (Reg)Yamaguchi Jun, (Reg)Tamaoki Naoki, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
FM-CVD
3DIC
AlN
ST-26338
Day 1
16:40– 17:00		EE124Investigation of the Growth Enhancement Effect of Pd on Co-ALD
(U. Tokyo) *(Reg)Deng Yubin, (Reg)Yamaguchi Jun, (Reg)Otaka Yuhei, (Stu)Nagai Souga, (Reg)Sato Noboru, (Reg)Tamaoki Naoki, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
Nucleation enhancer
ALD
ULSI
ST-26305
Day 2
9:00– 9:20		EE201Evaluation of the Effects of Wall Adsorption and Transport Phenomena on QCM-Based Adsorption Kinetics Analysis in ALD
(U. Tokyo) *(Reg)Yamaguchi Jun, (Stu)Wu Yuxuan, (Reg)Sato Noboru, (Reg)Tamaoki Naoki, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
ALD
Atomic Layer Deposition
QCM
ST-26806
Day 2
9:20– 9:40		EE202Temperature Dependence of TMA Adsorption Kinetics in Al2O3 Atomic Layer Deposition
(U. Tokyo) *(Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
Atomic Layer Depositon
Quartz Crystal Microbalance
Surface Adsorption
ST-26336
Day 2
9:40– 10:00		EE203Computation of Al2O3 ALD by trimethylaluminum with Kinetic Monte Carlo and neural network potential
(U. Tokyo) *(Stu)Zou Yichen, (Stu)Wu Yuxuan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
ALD
KMC
NNP
ST-26726
Day 2
10:00– 10:20		EE204Reaction Mechanism Analysis of Mo-CVD/ALD using Mo(CO)6
(U. Tokyo) *(Stu)Nagai Souga, Obara Soken, (U. Tokyo) (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Otaka Yuhei, (Reg)Tamaoki Naoki, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
Mo(CO)6
step coverage
interconnect
ST-26405
Day 2
13:40– 14:00		EE215Steric Hindrance Effects and Reaction Kinetics in Co-ALD Using CCTBA Precursor
(U. Tokyo) *(Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tamaoki Naoki, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
ALD
Atomic Layer Deposition
ST-26801
Day 2
14:00– 14:20		EE216Molecular dynamics simulations of precursor adsorption in the Co-ALD process using neural network potentials
(U. Tokyo) *(Reg)Tamaoki Naoki, (Reg)Sato Noboru, (Reg)Yamaguchi Jun, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro
Atomic layer deposition
Neural network potential
Growth per cycle
ST-26347

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SCEJ 56th Autumn Meeting (Tokyo, 2025)

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