EE121 - Hall EE, Day 1 - Hall and day program - SCEJ 56th Autumn Meeting (Tokyo, 2025)

`SCEJ 56th Autumn Meeting (Tokyo, 2025)`

Last modified: 2025-09-29 10:33:36

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Hall and day program : Hall EE, Day 1 : EE121

The preprints(abstracts) are now open. These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants (excludes free registration) and invited persons are required.

Hall EE(C.M. Bldg. 3F 2303), Day 1(Sep. 16)

ST-26

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
ST-26 [Trans-Division Symposium] CVD/ALD & Dry Process, Control of Structure and Function of Material by Reaction Engineering
(13:00–14:40) (Chair: Nishida Satoshi, Habuka Hitoshi)
13:00– 13:40	EE113	[Invited lecture] Development of carbon and carbon composite materials with a tailored nanostructure using CVD techniques (Fukushima U.) (Reg)Iwamura Shinichiroh	CVD Carbon	ST-26	285
13:40– 14:00	EE115	Evaluation of gas detection characteristics of TiO₂ nanoparticulate thin films fabricated in gas phase (Hiroshima U.) *(Stu·PCEF)Hara Takumi, (Stu·PCEF)Tanaka Naoki, (Reg)Kubo Masaru, (Reg)Shimada Manabu	gas sensor aerosol particle deposition plasma CVD	ST-26	672
14:00– 14:20	EE116	CH₄/CO₂ reforming for production of H₂-Rich gas and CNT: Influence of H₂S and H₂O (Kyoto U.) *(Stu)Saconsint Supanida, (Reg)Sano Noriaki, (Reg)Suzuki Tetsuo, (Mahidol U.) Ratchahat Sakhon	catalyst carbon nanotube biogas	ST-26	944
14:20– 14:40	EE117	Carbon deposition during dry reforming of CH₄ on Ni catalysts prepared by flame synthesis (Kanazawa U.) *(Reg)Fujiwara Kakeru, Ogata Isaki, (Reg)Osaka Yugo, (Reg)Tsujiguchi Takuya, (Reg)Kodama Akio	Flame spray pyrolysis Ni catalysts Dry reforming of methane	ST-26	277
14:40– 15:00		Break
(15:00–17:20) (Chair: Fujiwara Kakeru, Tamaoki Naoki)
15:00– 15:40	EE119	[Invited lecture] Synthesis of silica membranes using atmospheric-pressure plasma and their application in gas separation (Hiroshima U.) (Reg)Nagasawa Hiroki	plasma CVD gas separation	ST-26	731
15:40– 16:00	EE121	Deposition characteristics of TiSiCN by DC plasma CVD (Osaka Metro. U.) *(Stu)Kurogi Rizu, (Reg)Saito Takeyasu, (Reg)Okamoto Naoki, Kawamoto Mika	DC plasma CVD TiSiCN	ST-26	914
16:00– 16:20	EE122	Growth Dynamics of Bismuth-Based Perovskite Thin Films via Chemical Vapor Deposition (Kyoto U.) *(Int)Yang Ziguang, (Reg)Kawase Motoaki	Chemical vapor deposition Perovskite solar cell crystal orientation control	ST-26	888
16:20– 16:40	EE123	TMA/NH₃-based FM-CVD Process for High-Thermal-Conductivity AlN Films at 400 ^oC (U. Tokyo) *(Stu)Hatakeyama Daiki, (Reg)Otaka Yuhei, (Reg)Yamaguchi Jun, (Reg)Tamaoki Naoki, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	FM-CVD 3DIC AlN	ST-26	338
16:40– 17:00	EE124	Investigation of the Growth Enhancement Effect of Pd on Co-ALD (U. Tokyo) *(Reg)Deng Yubin, (Reg)Yamaguchi Jun, (Reg)Otaka Yuhei, (Stu)Nagai Souga, (Reg)Sato Noboru, (Reg)Tamaoki Naoki, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	Nucleation enhancer ALD ULSI	ST-26	305
17:00– 17:20	EE125	Investigation of alkyl chain length dependence of inhibitors for area selective deposition of HfO₂ (Kioxia) *(Reg)Tanuma Masakazu, Matsuba Hiroshi, Asakawa Koji, Fukumizu Hiroyuki	Area selective deposition Inhibitor	ST-26	740

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SCEJ 56th Autumn Meeting (Tokyo, 2025)

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