J213 - Hall J, Day 2 - Hall and day program - SCEJ 55th Autumn Meeting (Sapporo, 2024)

`SCEJ 55th Autumn Meeting (Sapporo, 2024)`

Last modified: 2024-09-19 02:24:28

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Hall and day program : Hall J, Day 2 : J213

The preprints are now open. These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants and invited persons are required.

Hall J(Block C 3F C310), Day 2(Sep. 12)

ST-25

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
ST-25 [Trans-Division Symposium] CVD, ALD and Dry Processes - Reaction Engineering for Structure & Function Control
(10:40–12:00) (Chair: Shimada Manabu, Tsukune Atsuhiro)
10:40– 11:20	J206	[Invited lecture] The latest trends in printed circuit boards that support new lifestyles (social environmental change) (Unimicron Japan) Waragai Yukishige	high-speed communication high heat dissipation printed circuit board	ST-25	257
11:20– 11:40	J208	Low-damage dispersion and spray-coating of carbon nanotubes for transparent heaters (Waseda U.) *(Stu)Hasumi Naoumi, (Reg)Ohsawa Toshio, (Reg)Noda Suguru	Carbon nanotubes Transparent heater Spray coating	ST-25	829
11:40– 12:00	J209	A reaction engineering approach of bismuth-based perovskite thin film orientation adjustment (Kyoto U.) *(Int)Yang Ziguang, (Reg)Kawase Motoaki	Chemical vapor deposition Perovskite solar cell crystal orientation control	ST-25	1098
(13:00–14:40) (Chair: Shimogaki Yukihiro, Nishida Satoshi)
13:00– 13:40	J213	[Invited lecture] Possibility of low-temperature deposition and processing using radical treatment (Kitami Inst. Tech.) *Takeyama Mayumi, Sato Masaru	3D-LSI low-temperature process radical treatment	ST-25	351
13:40– 14:00	J215	Low temperature FM-CVD for high thermal conductive AlN growth for 3DIC (U. Tokyo) *(Reg)Otaka Yuhei, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	AlN CVD 3DIC	ST-25	957
14:00– 14:20	J216	Investigation of reaction kinetic equation for film formation in the CVI process for production of SiC_f/SiC-CMC (U. Tokyo) *(Stu)Yoshida Koki, (Reg)Otaka Yuhei, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Shimogaki Yukihiro	SiC CVI CVD	ST-25	826
14:20– 14:40	J217	Comprehensive SiC-CVI process development for SiC_f/SiC-CMC mass production (U. Tokyo) *(Reg)Otaka Yuhei, (Stu)Yoshida Koki, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Shimogaki Yukihiro	SiC CVI CVD	ST-25	954

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SCEJ 55th Autumn Meeting (Sapporo, 2024)

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